Spectroscopic ellipsometry characterization of nano-crystalline diamond films prepared at various substrate temperatures and pulsed plasma frequencies using microwave plasma enhanced chemical vapor deposition apparatus with linear antenna delivery

2014 ◽  
Vol 571 ◽  
pp. 230-237 ◽  
Author(s):  
J. Mistrik ◽  
P. Janicek ◽  
A. Taylor ◽  
F. Fendrych ◽  
L. Fekete ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Pulsed Plasma ◽  
Linear Antenna ◽  
Nano Crystalline ◽  
Substrate Temperatures

Characterization of chemical bonding and physical characteristics of diamond-like amorphous carbon and diamond films

1992 ◽  
Vol 7 (2) ◽  
pp. 404-410 ◽  
Author(s):  
Bharat Bhushan ◽  
Andrew J. Kellock ◽  
Nam-Hee Cho ◽  
Joel W. Ager
Keyword(s):  
Chemical Vapor Deposition ◽  
Physical Properties ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Bulk Diamond

Diamond-like (amorphous) carbon (DLC) films were prepared by dc magnetron sputtering and plasma enhanced chemical vapor deposition (PECVD) and diamond films were prepared by microwave plasma enhanced chemical vapor deposition (MPECVD). For the first time, chemical and mechanical characterization of the films from each category are carried out systematically and a comparison of the chemical and physical properties is provided. We find that DLC coatings produced by PECVD are superior in microhardness and modulus of elasticity to those produced by sputtering. PECVD films contain a larger fraction of sp3-bonding than the sputtered hydrogenated carbon films. Chemical and physical properties of the diamond films appear to be close to those of bulk diamond.

scholarly journals Nano-Fabrication of Nano-Crystalline Diamond Films Grown by Microwave Plasma-Assisted Chemical Vapor Deposition

Hyomen Kagaku ◽  
2005 ◽  
Vol 26 (9) ◽  
pp. 542-546
Author(s):  
Hidenori GAMO ◽  
Mikka N.-GAMO ◽  
Norihito FUKUGAMI ◽  
Akira TAMURA ◽  
Toshihiro ANDO
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Nano Fabrication ◽  
Nano Crystalline
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