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Deposition and corrosion behavior of -oriented vanadium thick films by direct current magnetron sputtering
Thin Solid Films
◽
10.1016/j.tsf.2020.138491
◽
2020
◽
pp. 138491
Author(s):
Song Zhang
◽
Wenhua Xu
◽
Jun Li
◽
Rong Tu
Keyword(s):
Magnetron Sputtering
◽
Corrosion Behavior
◽
Direct Current
◽
Thick Films
◽
Direct Current Magnetron Sputtering
Download Full-text
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Corrosion behavior of nanolayered TiN/NbN multilayer coatings prepared by reactive direct current magnetron sputtering process
Thin Solid Films
◽
10.1016/j.tsf.2004.01.096
◽
2004
◽
Vol 460
(1-2)
◽
pp. 133-142
◽
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Author(s):
Harish C Barshilia
◽
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◽
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◽
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Corrosion Behavior
◽
Direct Current
◽
Multilayer Coatings
◽
Direct Current Magnetron Sputtering
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The growth of a multi-principal element (CoCrFeMnNi) oxynitride film by direct current magnetron sputtering using air as reactive gas
Surface and Coatings Technology
◽
10.1016/j.surfcoat.2021.127433
◽
2021
◽
pp. 127433
Author(s):
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◽
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◽
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◽
Zs. Czigány
◽
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...
Keyword(s):
Magnetron Sputtering
◽
Direct Current
◽
Principal Element
◽
Direct Current Magnetron Sputtering
◽
Oxynitride Film
◽
Reactive Gas
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ZrCuAlNi thin film metallic glass grown by high power impulse and direct current magnetron sputtering
Surface and Coatings Technology
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10.1016/j.surfcoat.2021.127029
◽
2021
◽
pp. 127029
Author(s):
Niklas Bönninghoff
◽
Wahyu Diyatmika
◽
Jinn P. Chu
◽
Stanislav Mráz
◽
Jochen M. Schneider
◽
...
Keyword(s):
Thin Film
◽
Metallic Glass
◽
Magnetron Sputtering
◽
Direct Current
◽
High Power
◽
Direct Current Magnetron Sputtering
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Synthesis and characterization of Cu3N–WC nanocomposite films prepared by direct current magnetron sputtering
Thin Solid Films
◽
10.1016/j.tsf.2010.05.053
◽
2010
◽
Vol 518
(18)
◽
pp. 5227-5232
◽
Cited By ~ 7
Author(s):
Shihong Zhang
◽
Yinsheng He
◽
Mingxi Li
◽
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◽
Sikchol Kwon
◽
...
Keyword(s):
Magnetron Sputtering
◽
Direct Current
◽
Nanocomposite Films
◽
Synthesis And Characterization
◽
Direct Current Magnetron Sputtering
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Tungsten-doped ZnO transparent conducting films deposited by direct current magnetron sputtering
Vacuum
◽
10.1016/j.vacuum.2010.05.010
◽
2010
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Vol 85
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◽
pp. 184-186
◽
Cited By ~ 16
Author(s):
Huafu Zhang
◽
Hanfa Liu
◽
Chengxin Lei
◽
Changkun Yuan
◽
Aiping Zhou
Keyword(s):
Magnetron Sputtering
◽
Direct Current
◽
Transparent Conducting Films
◽
Transparent Conducting
◽
Direct Current Magnetron Sputtering
◽
Doped Zno
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Compositional dependence of stress in silver copper alloys prepared by direct current magnetron sputtering
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
◽
10.1116/1.577799
◽
1992
◽
Vol 10
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◽
pp. 3439-3444
◽
Cited By ~ 1
Author(s):
A. M. Kazakos
◽
D. E. Fahnline
◽
R. Messier
◽
L. J. Pilione
Keyword(s):
Magnetron Sputtering
◽
Direct Current
◽
Copper Alloys
◽
Compositional Dependence
◽
Silver Copper
◽
Direct Current Magnetron Sputtering
Download Full-text
Synthesis and Characterization of Molybdenum Back Contact Using Direct Current-Magnetron Sputtering for Thin Film Solar Cells
Frontiers in Materials
◽
10.3389/fmats.2018.00013
◽
2018
◽
Vol 5
◽
Cited By ~ 2
Author(s):
Subhash M. Pandharkar
◽
Sachin R. Rondiya
◽
Avinash V. Rokade
◽
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◽
Habib M. Pathan
◽
...
Keyword(s):
Thin Film
◽
Solar Cells
◽
Magnetron Sputtering
◽
Direct Current
◽
Thin Film Solar Cells
◽
Synthesis And Characterization
◽
Back Contact
◽
Direct Current Magnetron Sputtering
Download Full-text
Effect of reflected Ar neutrals on tantalum diboride coatings prepared by direct current magnetron sputtering
Surface and Coatings Technology
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10.1016/j.surfcoat.2021.127463
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pp. 127463
Author(s):
K. Viskupová
◽
B. Grančič
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Magnetron Sputtering
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Direct Current
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Direct Current Magnetron Sputtering
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Effect of modulation period on structure and mechanical properties of WB2/a-WBC films deposited by direct-current magnetron sputtering
Thin Solid Films
◽
10.1016/j.tsf.2021.138994
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2021
◽
pp. 138994
Author(s):
Yanming Liu
◽
Xingxing Zhao
◽
Li Tian
◽
Chen Wang
◽
Zhiliang Pei
Keyword(s):
Mechanical Properties
◽
Magnetron Sputtering
◽
Direct Current
◽
Modulation Period
◽
Direct Current Magnetron Sputtering
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Structural, electrical and photoluminescence properties of ZnO:Al films grown on MgO(001) by direct current magnetron sputtering with the oblique target
Materials Chemistry and Physics
◽
10.1016/j.matchemphys.2010.12.026
◽
2011
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Vol 126
(3)
◽
pp. 866-872
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Cited By ~ 8
Author(s):
Hui Li
◽
Hong Qiu
◽
Mingpeng Yu
◽
Xiaobai Chen
Keyword(s):
Magnetron Sputtering
◽
Direct Current
◽
Photoluminescence Properties
◽
Direct Current Magnetron Sputtering
Download Full-text
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