Passivation properties of HfO2-SiO2 Mixed Metal Oxide Thin Films with Low Reflectivity on Silicon Substrates for Semiconductor Devices
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2015 ◽
Vol 71
(a1)
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pp. s63-s63
2015 ◽
Vol 5
(1)
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pp. R3100-R3106
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2016 ◽
Vol 138
(51)
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pp. 16800-16808
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