Temperature-dependent ion chemistry in nanosecond discharge plasma-assisted CH4 oxidation

Ion chemistry with temperature evolution in weakly ionized plasma is important in plasma-assisted combustion and plasma-assisted catalysis, fuel reforming, and material synthesis due to its contribution to plasma generation and state transition. In this study, the kinetic roles of ionic reactions in nanosecond discharge (NSD) plasma-assisted temperature-dependent decomposition and oxidation of methane are investigated by integrated studies of experimental measurements and mathematical simulations. A detailed plasma chemistry mechanism governing the decomposition and oxidation processes in a He/CH4/O2 combustible mixture is proposed and studied by including a set of electron impact reactions, reactions involving excited species, and ionic reactions. A zero-dimensional model incorporating the plasma kinetics solver ZDPlasKin and the combustion chemical kinetics solver CHEMKIN is used to calculate the time evolution of the ion density. Uncertainty analysis of ionic reactions on key species generation is conducted by using different referenced data, and insignificant sensitivity is found. The numerical model is consistent with experimental data for methane consumption and generation of major species including CO, CO2, and H2. By modeling the temporal evolution of key ions, it is observed that O2+ presents the largest concentration in the discharge stage, followed by CH4+, CH3+, and CH2+, which is in accordance with the traditional ion chemistry in hydrocarbon flames and agrees well with molecular-beam mass spectrometer investigations. The path flux shows that the concentrations of key species, including electrons, O, OH, H, O(1D), O2(a1Δg), O2+, CH3+, and CH4+, change within 1–2 orders of magnitude and that the transition from a homogeneous state to a contracted/constricted state does not occur. The path flux and sensitivity analysis reveal the significant roles of cations in the stimulation of active radical generation, including CH, O, OH, and O(1D), thus accelerating methane oxidation. This work provides a deep insight into the ion chemistry of temperature-dependent plasma-assisted CH4 oxidation.

Fluid, kinetic and hybrid approaches for neutral and trace ion edge transport modelling in fusion devices

Neutral gas physics and neutral interactions with the plasma are key aspects of edge plasma and divertor physics in a fusion reactor including the detachment phenomenon often seen as key to dealing with the power exhaust challenges. A full physics description of the neutral gas dynamics requires a 6D kinetic approach, potentially time dependent, where the details of the wall geometry play a substantial role, to the extent that, e.g., the subdivertor region has to be included. The Monte Carlo (MC) approach used for about 30 years in EIRENE [1], is well suited to solve these types of complex problems. Indeed, the MC approach allows simulating the 6D kinetic equation without having to store the velocity distribution on a 6D grid, at the cost of introducing statistical noise. MC also provides very good flexibility in terms of geometry and atomic and molecular (A&M) processes. However, it becomes computationally extremely demanding in high-collisional regions (HCR) as anticipated in ITER and DEMO. Parallelization on particles helps reducing the simulation wall clock time, but to provide speed-up in situations where single trajectories potentially involve a very large number of A&M events, it is important to derive a hierarchy of models in terms of accuracy and to clearly identify for what type of physics issues they provide reliable answers. It was demonstrated that advanced fluid neutral (AFN) models are very accurate in HCRs, and at least an order of magnitude faster than fully kinetic simulations. Based on these fluid models, three hybrid fluid-kinetic approaches are introduced: a spatially hybrid technique (SpH), a micro-Macro hybrid method (mMH), and an asymptotic-preserving MC (APMC) scheme, to combine the efficiency of a fluid model with the accuracy of a kinetic description. In addition, atomic and molecular ions involved in the edge plasma chemistry can also be treated kinetically within the MC solver, opening the way for further hybridisation by enabling kinetic impurity ion transport calculations. This paper aims to give an overview of methods mentioned and suggests the most prospective combinations to be developed.

Development of a Plasma Chemistry Model for Helicon Plasma Thruster analysis

The present work is part of a wider project aimed at improving the description of the plasma dynamics during the production phase of a Helicon Plasma Thruster. In particular, the work was focused on the development of a chemical model for Argon- and Xenon-based plasma. The developed model consists of a collisional radiative model suitable to describe the dynamics of the 1s and 2p excited levels. The model is meant to be complementary to 3D-VIRTUS, a numerical tool which enforces a fluid description of plasma, developed by the University of Padova to analyse helicon discharges. Once identified, the significant reactions for both propellants, the reaction rate coefficients, have been integrated exploiting cross sections from literature and assuming a Maxwellian velocity distribution function for all the species. These coefficients have been validated against experimental measurements of an Argon Inductively Coupled Plasma and compared with a well-established code. For Argon, the selected reactions have been reduced through a proposed lumping methodology. In this way, it was possible to reduce the number of equations of the system to solve, and implement them into 3D-VIRTUS. A validation against an experimental case taken from literature was performed, showing good agreement of the results. Regarding the Xenon model, only a verification has been performed against the results of another collisional-radiative model in literature. Finally, a predictive analysis of the propulsive performances of a Helicon Plasma Thruster for both Argon and Xenon is presented.

Comparison between Bosch and STiGer Processes for Deep Silicon Etching

The cryogenic process is well known to etch high aspect ratio features in silicon with smooth sidewalls. A time-multiplexed cryogenic process, called STiGer, was developed in 2006 and patented. Like the Bosch process, it consists in repeating cycles composed of an isotropic etching step followed by a passivation step. If the etching step is similar for both processes, the passivation step is a SiF4/O2 plasma that efficiently deposits a SiOxFy layer on the sidewalls only if the substrate is cooled at cryogenic temperature. In this paper, it is shown that the STiGer process can achieve profiles and performances equivalent to the Bosch process. However, since sidewall passivation is achieved with polymer free plasma chemistry, less frequent chamber cleaning is necessary, which contributes to increase the throughput.