Substrate nitridation effect and low temperature growth of GaN on sapphire (0 0 0 1) by plasma-excited organometallic vapor-phase epitaxy

1998 ◽  
Vol 183 (1-2) ◽  
pp. 62-68 ◽  
Author(s):  
Takashi Tokuda ◽  
Akihiro Wakahara ◽  
Susumu Noda ◽  
Akio Sasaki
2007 ◽  
Vol 56 (9) ◽  
pp. 880-885
Author(s):  
Keiji HIDAKA ◽  
Takashi HIRAMATSU ◽  
Yoshikazu TERAI ◽  
Osamu ERYU ◽  
Yasufumi FUJIWARA

1995 ◽  
Vol 24 (9) ◽  
pp. 1093-1097 ◽  
Author(s):  
K. Yasuda ◽  
H. Hatano ◽  
T. Ferid ◽  
K. Kawamoto ◽  
T. Maejima ◽  
...  

2003 ◽  
Vol 764 ◽  
Author(s):  
Hai-Ping Liu ◽  
In-Gann Chen ◽  
Jenq-Dar Tsay ◽  
Wen-Yueh Liu ◽  
Yih-Der Guo ◽  
...  

AbstractThe low temperature growth of GaN crystal using epitaxy lateral overgrowth (ELO) on SiO2 dot pattern below 900°C by hydride vapor phase epitaxy (HVPE) have been studied. It is observed that the growth rate of GaN hexagonal pyramidal crystals along [1101] direction increases as growth temperature decreases. At low temperature of ∼ 850°C, hexagonal GaN columnar crystals with high index facet at the top can be observed. It is proposed that the surface diffusion length of precursors, such as NH3 and GaCl, decreases at lower temperature that reduces the probability of desorption and increase the lifetime. The condensation of Ga liquid droplets on the GaN surface will change the relative stability of {1101} facet. Therefore, the formation of high index planes such as {2122} facet on the top of hexagonal column along with the formation of stacking fault on the (0001) plane can be observed. A detailed study of the effect of growth temperature on the crystal growth mechanism will be presented.


2002 ◽  
Vol 80 (12) ◽  
pp. 2054-2056 ◽  
Author(s):  
Y. Takano ◽  
K. Kobayashi ◽  
H. Iwahori ◽  
N. Kuroyanagi ◽  
K. Kuwahara ◽  
...  

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