Lateral overgrowth of high quality GaN layers on GaN/Al2O3 patterned substrates by halide vapour-phase epitaxy

1998 ◽  
Vol 192 (1-2) ◽  
pp. 73-78 ◽  
Author(s):  
G Nataf ◽  
B Beaumont ◽  
A Bouillé ◽  
S Haffouz ◽  
M Vaille ◽  
...  
1999 ◽  
Vol 59 (1-3) ◽  
pp. 112-116 ◽  
Author(s):  
G. Nataf ◽  
B. Beaumont ◽  
A. Bouillé ◽  
P. Vennéguès ◽  
S. Haffouz ◽  
...  

1993 ◽  
Vol 308 ◽  
Author(s):  
N. Briot ◽  
T. Cloitre ◽  
O. Briot ◽  
P. Boring ◽  
B.E. Ponga ◽  
...  

ABSTRACTThe ZnSe-ZnTe combination is a potential candidate for the realisation of visible light-emitting devices. The lattice mismatch between bulk ZnSe and bulk ZnTe is important (∼ 8%). Therefore, their hetero-structures are strained and high quality superlattices will only be grown if having small periods. This prescription can be fulfilled in the case of metal organic vapour phase epitaxy (MOVPE) growth by combining triethylamine dimethyl zinc adduct with di-isopropyl telluride as precursors for the growth of the ZnTe layers. The growth of high quality ZnTe can then be performed at a temperature of 300ºC , close to the best MOVPE-growth temperature for ZnSe (280ºC). Lowering the growth temperature of ZnTe to this value, we could thus obtain sharp interfaces. This work reports on ZnSe-ZnTe superlattices grown on ZnSe and ZnTe buffers deposited on GaAs substrates. We demonstrate that the stokes-shift between the reflectance and photoluminescence features ( ∼ 40 meV ) measured when the thickness of ZnSe layers does not exceed 20 Å, drastically increases for layer thicknesses beyond this critical value. This, we interpret in terms of the onset of plastic relaxation which favours tellurium diffusion in the ZnSe slices. Then photoluminescence spectra broaden ( contributions of trapped-excitons dominate), and observation of free excitons in reflectance become impossible. We have studied in detail the optical properties of the superlattices and compared our findings with the predictions of a multiband envelope function calculation. We show that both zone centre excitons as well as excitons associated with the miniband dispersions (saddle-point excitons) are observed in these superlattices.


2007 ◽  
Vol 300 (1) ◽  
pp. 104-109 ◽  
Author(s):  
C. Liu ◽  
P.A. Shields ◽  
S. Denchitcharoen ◽  
S. Stepanov ◽  
A. Gott ◽  
...  

2015 ◽  
Vol 3 (2) ◽  
pp. 431-437 ◽  
Author(s):  
Michele Conroy ◽  
Vitaly Z. Zubialevich ◽  
Haoning Li ◽  
Nikolay Petkov ◽  
Justin D. Holmes ◽  
...  

We report an inexpensive nanoscale patterning process for epitaxial lateral overgrowth (ELOG) in AlN layers grown by metal organic vapour phase epitaxy (MOVPE) on sapphire.


Author(s):  
M. Mynbaeva ◽  
A. Titkov ◽  
A. Kryzhanovski ◽  
I. Kotousova ◽  
A.S. Zubrilov ◽  
...  

We have studied epitaxial GaN layers grown by hydride vapour phase epitaxy (HVPE) on porous GaN sublayers formed on SiC substrates. It was shown that these layers can be grown with good surface morphology and high crystalline quality. X-ray, Raman and photoluminescent (PL) measurements showed that the stress in the layers grown on porous GaN was reduced to 0.1-0.2 GPa, while the stress in the layers grown directly on 6H-SiC substrates remains at its usual level of about 1 GPa. Thus, we have shown that growth on porous GaN sublayer is a promising method for fabrication of high quality epitaxial layers of GaN with low strain values.


Author(s):  
B. Beaumont ◽  
M. Vaille ◽  
G. Nataf ◽  
A. Bouillé ◽  
J.-C. Guillaume ◽  
...  

Selective and lateral overgrowth by Metal Organics Vapour Phase Epitaxy (MOVPE) was carried out until coalescence to produce smooth and optically flat thick GaN layers. A GaN epitaxial layer is first grown using atmospheric pressure Metalorganic Vapour Phase Epitaxy on a {0001} Al2O3. substrate. Then a 30Å silicon nitride dielectric film is deposited in-situ by reaction of silane and ammonia to form a selective mask. Afterwards, the openings and the figures in the dielectric films are achieved using standard photolithographic technology. Stripes openings in the mask, revealing free GaN surface, are aligned in the 〈100〉 direction. Typical stripes spacing and width are 10 µm and 5 µm respectively. These patterned layers are further on used for epitaxial regrowth of GaN by MOVPE. The growth anisotropy and therefore the coalescence process is achieved by introducing (MeCp)2Mg in the vapour phase. A two-step process is reported which allows a dramatic reduction of threading dislocations density not only above the masked areas but also above the windows opened in the mask. With this process, very sharp bound exciton luminescence peaks are measured at low temperature in the overgrown GaN.


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