Deep level effects on the characteristics of Al0.24Ga0.76As/In0.20Ga0.80As/GaAs and In0.48Ga0.52P/In0.20Ga0.80As/GaAs high electron mobility transistors grown by solid source molecular beam epitaxy

2000 ◽  
Vol 44 (11) ◽  
pp. 1909-1916 ◽  
Author(s):  
S.F Yoon ◽  
K.H Yip ◽  
H.Q Zheng ◽  
B.P Gay
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