Dry processing of thin film capacitors arrays using ion beam assisted deposition

2004 ◽  
Vol 447-448 ◽  
pp. 388-391 ◽  
Author(s):  
Ari Ide-Ektessabi ◽  
Hiroki Uehara ◽  
Susumu Kamitani
2011 ◽  
Vol 519 (21) ◽  
pp. 7317-7320 ◽  
Author(s):  
H. Zachmann ◽  
S. Puttnins ◽  
F. Daume ◽  
A. Rahm ◽  
K. Otte

2000 ◽  
Vol 15 (11) ◽  
pp. 2292-2295 ◽  
Author(s):  
Young-Joon Park ◽  
Young-Joon Baik ◽  
Jae Hyoung Choi ◽  
Jeong Yong Lee ◽  
Jun-Hee Hahn

BN films consisting of c-BN and h-BN phases were synthesized using an ion-beam-assisted deposition process. In contrast to conventional observations, the c-BN and h-BN phases did not form separate layers, but were distributed in the form of nano-sized grains throughout the film thickness. No distinctly aligned h-BN layer was observed before the c-BN phase. Such a mixed character of the film was attributed to a localized ion bombardment effect instead of the macro-stress. Possibly because of the presence of scattered h-BN phases, the thin film described here possessed a low hardness of about 20 GPa and a low stress of about 5 GPa, compared with other reported c-BN-containing films.


2009 ◽  
Vol 517 (23) ◽  
pp. 6341-6344 ◽  
Author(s):  
Y. Vygranenko ◽  
K. Wang ◽  
R. Chaji ◽  
M. Vieira ◽  
J. Robertson ◽  
...  

1999 ◽  
Author(s):  
H. Katsumata ◽  
J. Matsuo ◽  
T. Nishihara ◽  
T. Tachibana ◽  
K. Yamada ◽  
...  

1994 ◽  
Vol 66 (1-3) ◽  
pp. 514-518 ◽  
Author(s):  
Yoshinori Funada ◽  
Kaoru Awazu ◽  
Kisaburo Shimamura ◽  
Hiroshi Watanabe ◽  
Masaya Iwaki

Sign in / Sign up

Export Citation Format

Share Document