Nonresonant amplification of spin waves through interface magnetoelectric effect and spin-transfer torque

We present a new mechanism for manipulation of the spin-wave amplitude through the use of the dynamic charge-mediated magnetoelectric effect in ultrathin multilayers composed of dielectric thin-film capacitors separated by a ferromagnetic bilayer. Propagating spin waves can be amplified and attenuated with rising and decreasing slopes of the oscillating voltage, respectively, locally applied to the sample. The way the spin accumulation is generated makes the interaction of the spin-transfer torque with the magnetization dynamics mode-selective and restricted to some range of spin-wave frequencies, which is contrary to known types of the spin-transfer torque effects. The interfacial nature of spin-dependent screening allows to reduce the thickness of the fixed magnetization layer to a few nanometers, thus the proposed effect significantly contributes toward realization of the magnonic devices and also miniaturization of the spintronic devices.

Influence of antiferroelectric-like behavior on tuning properties of ferroelectric HZO-based varactors

In this article, we investigate the capacitance–voltage (C–V) characteristics of $$\text {Hf}_{x}\text {Zr}_{1-x}\text {O}_{2}$$ Hf x Zr 1 - x O 2 metal-ferroelectric-metal (MFM) thin-film capacitors with various Zr doping for varactor applications. The impact of field cycling during the wake-up process on the capacitance was analyzed. In addition, the effect of antiferroelectric-like (AFE) behavior on tuning was investigated. The transition between ferroelectric (FE) and AFE regime is particularly interesting for varactor application, as a reduced bias is required for tuning. The cycle dependence of the FE and AFE properties at elevated temperatures was also investigated, where it was shown that with an increase of temperature, the tunability is reduced. Temperature measurements also comply with recent studies of ferroelastic nature of AFE behavior. Graphic abstract

Boosting energy storage performance of low-temperature sputtered CaBi2Nb2O9 thin film capacitors via rapid thermal annealing

CaBi2Nb2O9 thin film capacitors were fabricated on SrRuO3-buffered Pt(111)/Ti/Si(100) substrates by adopting a two-step fabrication process. This process combines a low-temperature sputtering deposition with a rapid thermal annealing (RTA) to inhibit the grain growth, for the purposes of delaying the polarization saturation and reducing the ferroelectric hysteresis. By using this method, CaBi2Nb2O9 thin films with uniformly distributed nanograins were obtained, which display a large recyclable energy density Wrec ≈ 69 J/cm3 and a high energy efficiency η ≈ 82.4%. A superior fatigue-resistance (negligible energy performance degradation after 109 charge-discharge cycles) and a good thermal stability (from −170 to 150 °C) have also been achieved. This two-step method can be used to prepare other bismuth layer-structured ferroelectric film capacitors with enhanced energy storage performances.