Passivation role of sulfur and etching behavior in plasma etched TiW using SF6 and BCl3 gases
1997 ◽
Vol 33
(1-4)
◽
pp. 223-229
◽
Keyword(s):
1987 ◽
Vol 5
(4)
◽
pp. 1578-1584
◽
2021 ◽
Vol 9
(4)
◽
pp. 1646-1655
Keyword(s):
Keyword(s):
2000 ◽
Vol 179
◽
pp. 387-388