Erratum to: “Secondary-ion mass spectrometry (SIMS) analysis of catalyst coatings used in microreactors” [Nucl. Instr. and Meth. B 219–220 (2004) 880–885]
AbstractThis article presents an overview of our current understanding of the fundamental factors underlying Secondary Ion Mass Spectrometry (SIMS). Included is a discussion of the sputtering process and possible mechanisms which produce ejected ions. Presently available instrumentation for SIMS analysis is discussed and some examples of SIMS analysis are also given.
ABSTRACTIn a previous publication, preliminary results obtained using secondary ion mass spectrometry to determine selective elemental distributions in cast iron were reported. These results were used to tentatively assign possible roles to the important solutes in controlling the graphite morphology. The current paper is a continuation of this work and presents the most recent results of the SIMS analysis.
Charge compensation of insulators in secondary ion mass spectrometry (SIMS) analysis.