Impulse plasma deposition of aluminum oxide layers for Al2O3/Si, SiC, GaN systems

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00527-9 ◽

2003 ◽

Vol 174-175 ◽

pp. 170-175 ◽

Author(s):

A. Werbowy ◽

K. Zdunek ◽

E. Dusiński ◽

J. Szmidt ◽

M. Elert

Keyword(s):

Aluminum Oxide ◽

Plasma Deposition ◽

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Low-temperature laser generated ultrathin aluminum oxide layers for effective c-Si surface passivation

Applied Surface Science ◽

10.1016/j.apsusc.2019.02.023 ◽

2019 ◽

Vol 480 ◽

pp. 35-42 ◽

Author(s):

Peixun Fan ◽

Zeming Sun ◽

George C. Wilkes ◽

Mool C. Gupta

Keyword(s):

Low Temperature ◽

Aluminum Oxide ◽

Surface Passivation ◽

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Electrical insulation performance of aluminum oxide layers on metallic substrates – HiPIMS compared to RF-MS

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2019.01.010 ◽

2019 ◽

Vol 361 ◽

pp. 119-122

Author(s):

Frank Schmaljohann ◽

Daniel Hagedorn ◽

Frank Löffler

Keyword(s):

Aluminum Oxide ◽

Electrical Insulation ◽

Oxide Layers ◽

Metallic Substrates ◽

Insulation Performance

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Hillock morphology and density in AlTa and AlCu alloy films encapsulated with aluminum oxide layers

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54661 ◽

1998 ◽

Author(s):

Eiji Iwamura ◽

Katsutoshi Takagi ◽

Takashi Ohnishi

Keyword(s):

Aluminum Oxide ◽

Alloy Films ◽

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Insertion loss characteristics of passive devices fabricated on anodized aluminum oxide layers formed on Si substrates

Sensors and Actuators A Physical ◽

10.1016/j.sna.2009.11.021 ◽

2010 ◽

Vol 157 (1) ◽

pp. 32-35 ◽

Author(s):

Hye Min Ji ◽

Won Sang Lee ◽

Daniel S. Choi ◽

Young Keun Kim

Keyword(s):

Aluminum Oxide ◽

Insertion Loss ◽

Anodized Aluminum ◽

Anodized Aluminum Oxide ◽

Oxide Layers ◽

Si Substrates ◽

Passive Devices

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Charge properties of aluminum oxide layers synthesized by molecular layering

Technical Physics Letters ◽

10.1134/1.1262179 ◽

1998 ◽

Vol 24 (7) ◽

pp. 525-526 ◽

Author(s):

S. G. Sazonov ◽

Z. N. Zuluev ◽

V. E. Drozd ◽

I. O. Nikiforova

Keyword(s):

Aluminum Oxide ◽

Molecular Layering ◽

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Observation of compensation effects during the thermal dissolution of aluminum oxide layers on tungsten and molybdenum 〈111〉 and on tungsten {110} in the presence of electric fields

Surface Science ◽

10.1016/0039-6028(84)90386-8 ◽

1984 ◽

Vol 140 (1) ◽

pp. 123-136 ◽

Author(s):

R. Vanselow ◽

L.R. Pederson

Keyword(s):

Aluminum Oxide ◽

Electric Fields ◽

Oxide Layers ◽

Thermal Dissolution

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Air-Impregnated Nanoporous Anodic Aluminum Oxide Layers for Enhancing the Corrosion Resistance of Aluminum

Langmuir ◽

10.1021/acs.langmuir.5b02392 ◽

2015 ◽

Vol 31 (40) ◽

pp. 11040-11050 ◽

Author(s):

Chanyoung Jeong ◽

Junghoon Lee ◽

Keith Sheppard ◽

Chang-Hwan Choi

Keyword(s):

Corrosion Resistance ◽

Aluminum Oxide ◽

Anodic Aluminum Oxide ◽

Oxide Layers ◽

Anodic Aluminum ◽

Nanoporous Anodic Aluminum Oxide ◽

Nanoporous Anodic Aluminum

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Investigation of properties of coatings made by plasma deposition of aluminum oxide on titanium alloy parts

All the materials Encyclopedic Reference Book ◽

10.31044/1994-6260-2019-0-3-26-28 ◽

2019 ◽

Vol 3 ◽

pp. 26-28

Author(s):

I.N. Kravchenko ◽

◽

A.A. Sevryukov ◽

V.M. Korneyev ◽

T.A. Chekha ◽

...

Keyword(s):

Titanium Alloy ◽

Aluminum Oxide ◽

Plasma Deposition ◽

Properties Of Coatings

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GaAs structures with a gate dielectric based on aluminum-oxide layers

Semiconductors ◽

10.1134/s106378261602010x ◽

2016 ◽

Vol 50 (2) ◽

pp. 204-207 ◽

Author(s):

I. L. Kalentyeva ◽

O. V. Vikhrova ◽

A. V. Zdoroveyshchev ◽

Yu. A. Danilov ◽

A. V. Kudrin

Keyword(s):

Aluminum Oxide ◽

Gate Dielectric ◽

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Coloring aluminum oxide layers

Metal Finishing ◽

10.1016/s0026-0576(02)80919-9 ◽

2002 ◽

Vol 100 (10) ◽

pp. 96

Keyword(s):

Aluminum Oxide ◽

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