Fourth international workshop on stress induced phenomena in metallization
Latest Publications

TOTAL DOCUMENTS

54

(FIVE YEARS 0)

H-INDEX

3

(FIVE YEARS 0)

Published By ASCE

1563966824

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Stress relaxation and void formation in passivated Al(Cu) line structures

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54647 ◽

1998 ◽

Author(s):

I.-S. Yeo ◽

P. S. Ho ◽

S. G. H. Anderson ◽

H. Kawasaki

Keyword(s):

Stress Relaxation ◽

Download Full-text

Si-surface amorphization effects for C49-to-C54 phase transformation in

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54668 ◽

1998 ◽

Author(s):

Hitoshi Wakabayashi ◽

Yukishige Saito ◽

Tohru Mogami ◽

Takemitsu Kunio

Keyword(s):

Phase Transformation

Download Full-text

Aluminium via-fill at elevated pressure and temperature

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54655 ◽

1998 ◽

Author(s):

G. C. A. M. Janssen ◽

J. F. Jongste ◽

J. P. Lokker ◽

A. H. Verbruggen ◽

S. Radelaar

Keyword(s):

Elevated Pressure

Download Full-text

Laser microscopy of

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54667 ◽

1998 ◽

Author(s):

Kazuto Ikeda ◽

Takahiro Kimura ◽

Tomoji Nakamura

Keyword(s):

Laser Microscopy

Download Full-text

Nanostructural investigation of whiskers and hillocks of Al-based metallization in thin-film transistor liquid crystal displays

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54659 ◽

1998 ◽

Author(s):

Katsuhiro Tsujimoto ◽

Satoshi Tsuji ◽

Hiroshi Takatsuji ◽

Kotaro Kuroda ◽

Hiroyasu Saka ◽

...

Keyword(s):

Thin Film ◽

Liquid Crystal ◽

Thin Film Transistor ◽

Liquid Crystal Displays

Download Full-text

A study of hillock suppression in Al alloy interconnections for liquid crystal displays

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54658 ◽

1998 ◽

Author(s):

Takashi Onishi ◽

Eiji Iwamura ◽

Katsutoshi Takagi

Keyword(s):

Liquid Crystal ◽

Liquid Crystal Displays ◽

Download Full-text

Ti and Co silicide phase formation and transformations on deep-sub-micron gates for ULSI applications

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54665 ◽

1998 ◽

Author(s):

Jorge A. Kittl ◽

Qi-Zhong Hong

Keyword(s):

Phase Formation ◽

Download Full-text

High resistance to stress-migration of [111] textured Al electrodes for surface acoustic wave devices

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54644 ◽

1998 ◽

Author(s):

Atsushi Kamijo ◽

Noritsugu Matsukura

Keyword(s):

Acoustic Wave ◽

Surface Acoustic Wave ◽

High Resistance ◽

Resistance To Stress ◽

Acoustic Wave Devices

Download Full-text

Finite element analysis of electromigration and stress in interconnects

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54650 ◽

1998 ◽

Author(s):

A. F. Bower ◽

D. Fridline ◽

A. Kumar ◽

C. F. Shih ◽

L. Xia ◽

...

Keyword(s):

Finite Element Analysis ◽

Finite Element ◽

Element Analysis

Download Full-text

Electromigration mass transport phenomena in Al thin-film conductors with bamboo microstructure

Fourth international workshop on stress induced phenomena in metallization ◽

10.1063/1.54660 ◽

1998 ◽

Author(s):

Anthony S. Oates

Keyword(s):

Thin Film ◽

Mass Transport ◽

Transport Phenomena ◽

Download Full-text