High current-density broad-beam boron ion implantation

1997 ◽  
Vol 96 (1) ◽  
pp. 52-57 ◽  
Author(s):  
P.J. Wilbur ◽  
J.A. Davis ◽  
D.L. Williamson ◽  
J.J. Vajo ◽  
R. Wei
Keyword(s):  
Ion Implantation ◽  
Current Density ◽  
High Current Density ◽  
High Current ◽  
Broad Beam

High current density, broad beam ion implantation

1989 ◽  
Vol 116 ◽  
pp. 215-220 ◽  
Author(s):  
P.J Wilbur ◽  
R Wei ◽  
W.S Sampath
Keyword(s):  
Ion Implantation ◽  
Current Density ◽  
High Current Density ◽  
High Current ◽  
Broad Beam

High current density, low energy, ion implantation of AISI-M2 tool steel for tribological applications

1996 ◽  
Vol 83 (1-3) ◽  
pp. 250-256 ◽  
Author(s):  
P.J. Wilbur ◽  
J.A. Davis ◽  
R. Wei ◽  
J.J. Vajo ◽  
D.L. Williamson
Keyword(s):  
Ion Implantation ◽  
Tool Steel ◽  
Current Density ◽  
High Current Density ◽  
Low Energy ◽  
High Current

High current density ion implantation and its application to improve the wear resistance of ferrous materials

Wear ◽  
1997 ◽  
Vol 203-204 ◽  
pp. 596-607 ◽  
Author(s):  
A.V. Byeli ◽  
V.A. Kukareko ◽  
O.V. Lobodaeva ◽  
P.J. Wilbur ◽  
J.A. Davis
Keyword(s):  
Wear Resistance ◽  
Ion Implantation ◽  
Current Density ◽  
High Current Density ◽  
High Current

Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation

1999 ◽  
Vol 14 (11) ◽  
pp. 4351-4357 ◽  
Author(s):  
Zoran Falkenstein ◽  
Kevin C. Walter ◽  
Michael A. Nastasi ◽  
Donald J. Rej ◽  
Nikolai V. Gavrilov
Keyword(s):  
Surface Modification ◽  
Ion Implantation ◽  
Dose Rate ◽  
Current Density ◽  
High Current Density ◽  
Ion Beam ◽  
Plasma Source ◽  
High Current ◽  
Beam Source ◽  
Plasma Source Ion Implantation

Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam source can be characterized, with respect to surface modification use, by a uniform emitted dose rate in the range of 1016 to 5 × 1017 N cm−2 min−1 over an area of <100 cm2 and with acceleration energies of 10–50 keV. The implantation range and retained dose (measured using ion-beam analysis), the surface hardness, coefficient of friction, and the change in the wear coefficient (measured by nanohardness indentation and pin-on-disk wear testing) that were obtained with an applied dose rate of ∼1.7 × 1017 N cm−2 min−1 at 25 kV are given, and they are compared to results obtained with plasma-source ion implantation.

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