Characterization of plasma conditions in a hollow cathode arc evaporation device

Surface and Coatings Technology ◽

10.1016/s0257-8972(99)00508-3 ◽

2000 ◽

Vol 123 (2-3) ◽

pp. 231-238 ◽

Author(s):

G. Rohrbach ◽

A. Lunk

Keyword(s):

Hollow Cathode ◽

Cathode Arc ◽

Arc Evaporation

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Deposition of hard coatings by a hollow-cathode arc evaporation device

Materials Science and Engineering A ◽

10.1016/0921-5093(91)90493-7 ◽

1991 ◽

Vol 140 ◽

pp. 666-669 ◽

Author(s):

A. Lunk

Keyword(s):

Hollow Cathode ◽

Hard Coatings ◽

Cathode Arc ◽

Arc Evaporation

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Influence of the deposition parameters on boron nitride growth mechanisms in a hollow cathode arc evaporation device

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00010-8 ◽

1997 ◽

Vol 92 (1-2) ◽

pp. 96-103 ◽

Author(s):

K.-L. Barth ◽

A. Lunk ◽

J. Ulmer

Keyword(s):

Boron Nitride ◽

Hollow Cathode ◽

Growth Mechanisms ◽

Deposition Parameters ◽

Cathode Arc ◽

Arc Evaporation

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Ellipsometric investigations during titanium deposition in a hollow cathode arc evaporation device

Thin Solid Films ◽

10.1016/0040-6090(95)06549-0 ◽

1995 ◽

Vol 263 (1) ◽

pp. 18-27 ◽

Author(s):

H. Steffen ◽

H. Wulff

Keyword(s):

Hollow Cathode ◽

Cathode Arc ◽

Arc Evaporation

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Characterization of Dual Hollow Cathode Arc Chemical Vapor Deposition by Optical Emission Spectroscopy

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.6438 ◽

1999 ◽

Vol 38 (Part 1, No. 11) ◽

pp. 6438-6444 ◽

Author(s):

Gou-Tsau Liang ◽

Franklin Chau-Nan Hong

Keyword(s):

Chemical Vapor Deposition ◽

Hollow Cathode ◽

Vapor Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Chemical Vapor ◽

Optical Emission ◽

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Deposition of c-BN films in a hollow cathode arc evaporation device

Diamond and Related Materials ◽

10.1016/0925-9635(96)00544-4 ◽

1996 ◽

Vol 5 (11) ◽

pp. 1270-1274 ◽

Author(s):

K.-L. Barth ◽

A. Neuffer ◽

J. Ulmer ◽

A. Lunk

Keyword(s):

Hollow Cathode ◽

Cathode Arc ◽

Arc Evaporation

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Plasma Diagnostics in a Hollow Cathode arc Evaporation System During TinX-Deposition

Contributions to Plasma Physics ◽

10.1002/ctpp.2150300509 ◽

1990 ◽

Vol 30 (5) ◽

pp. 637-648 ◽

Author(s):

A. Lunk ◽

R. Basner

Keyword(s):

Hollow Cathode ◽

Plasma Diagnostics ◽

Cathode Arc ◽

Arc Evaporation

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Far-forward scattering of CO2-laser radiation by density fluctuations in a hollow cathode arc

Plasma Physics and Controlled Fusion ◽

10.1088/0741-3335/33/12/003 ◽

1991 ◽

Vol 33 (12) ◽

pp. 1371-1380 ◽

Author(s):

A Brockhaus ◽

J Uhlenbusch

Keyword(s):

Laser Radiation ◽

Co2 Laser ◽

Hollow Cathode ◽

Forward Scattering ◽

Density Fluctuations ◽

Co2 Laser Radiation ◽

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Characterization of Titanium Nitride Coatings Deposited by Metal Plasma Ion Pre-Implantation and Cathodic Arc Evaporation

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2009.c102 ◽

2009 ◽

Vol 9 (2) ◽

pp. 1127-1132 ◽

Author(s):

Ko-Wei Weng ◽

Ya-Chi Chen ◽

Tai-Nan Lin ◽

Da-Yun Wang

Keyword(s):

Titanium Nitride ◽

Metal Plasma ◽

Nitride Coatings ◽

Cathodic Arc Evaporation ◽

Arc Evaporation ◽

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Diamond Growth by Dual Hollow Cathode Arc Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l1406 ◽

1997 ◽

Vol 36 (Part 2, No. 10B) ◽

pp. L1406-L1409 ◽

Author(s):

Gou-Tsau Liang ◽

Franklin Chau-Nan Hong

Keyword(s):

Chemical Vapor Deposition ◽

Hollow Cathode ◽

Vapor Deposition ◽

Chemical Vapor ◽

Diamond Growth ◽

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Instrumental system for multidimensional spectroscopic characterization of a radio frequency boosted, pulsed hollow cathode lamp

Analytical Chemistry ◽

10.1021/ac00243a011 ◽

1982 ◽

Vol 54 (6) ◽

pp. 885-890 ◽

Author(s):

Paul B. Farnsworth ◽

John P. Walters

Keyword(s):

Radio Frequency ◽

Hollow Cathode ◽

Spectroscopic Characterization ◽

Hollow Cathode Lamp ◽

Instrumental System

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