Improvement of total reflection X-ray fluorescence analysis of low Z elements on silicon wafer surfaces at the PTB monochromator beamline for undulator radiation at the electron storage ring BESSY II

2001 ◽  
Vol 56 (11) ◽  
pp. 2073-2083 ◽  
Author(s):  
B Beckhoff ◽  
R Fliegauf ◽  
G Ulm ◽  
G Pepponi ◽  
C Streli ◽  
...  
Keyword(s):  
Silicon Wafer ◽  
Storage Ring ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
Electron Storage ◽  
Undulator Radiation ◽  
X Ray ◽  
Wafer Surfaces

Ultratrace speciation of nitrogen compounds in aerosols collected on silicon wafer surfaces by means of TXRF-NEXAFS

2004 ◽  
Vol 19 (1) ◽  
pp. 81-86 ◽  
Author(s):  
S. Török ◽  
J. Osán ◽  
B. Beckhoff ◽  
G. Ulm
Keyword(s):  
Silicon Wafer ◽  
Detection Limits ◽  
Fluorescence Analysis ◽  
Nitrogen Compounds ◽  
Undulator Radiation ◽  
X Ray ◽  
Acceptable Accuracy ◽  
Rural Aerosols ◽  
X Ray Absorption ◽  
Wafer Surfaces

Total reflection X-ray fluorescence analysis (TXRF) using monochromatized undulator radiation in the PTB radiometry laboratory at the synchrotron radiation facility BESSY II has been employed to investigate the chemical state of nitrogen compounds in aerosols. The aerosol samples of different size fractions were deposited on silicon wafer surfaces in a May impactor. Using a thin window Si(Li) detector, TXRF detection limits for nitrogen are in the upper fg and lower pg range. Taking advantage of the tunability of monochromatized undulator radiation, the near edge X-ray absorption fine structure (NEXAFS) could be combined with TXRF analysis, allowing for the speciation of the aerosols at the nitrogen K absorption edge. Such low detection limits enable an analysis of aerosol samples taken in 10 min with acceptable accuracy. Applicability of the technique to real aerosol samples has been used to compare nitrogen oxidation state in suburban and rural aerosols

Analysis of Ni on Si-wafer surfaces using synchrotron radiation excited total reflection X-ray fluorescence analysis

1997 ◽  
Vol 52 (7) ◽  
pp. 901-906 ◽  
Author(s):  
P. Wobrauschek ◽  
R. Görgl ◽  
P. Kregsamer ◽  
Ch. Streli ◽  
S. Pahlke ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
X Ray ◽  
Wafer Surfaces ◽  
Si Wafer
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