Depth profiling of a Co-implanted silicon wafer by total-reflection X-ray fluorescence analysis after repeated oxidation and HF-etching

1999 ◽  
Vol 36 (2) ◽  
pp. 27-29 ◽  
Author(s):  
R. Klockenkämper ◽  
A. von Bohlen
Keyword(s):  
Silicon Wafer ◽  
Depth Profiling ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
X Ray

Detection of unknown localized contamination on silicon wafer surface by sweeping-total reflection X-ray fluorescence analysis

2004 ◽  
Vol 59 (8) ◽  
pp. 1277-1282 ◽  
Author(s):  
Yoshihiro Mori ◽  
Kenichi Uemura ◽  
Hiroshi Kohno ◽  
Motoyuki Yamagami ◽  
Takashi Yamada ◽  
...  
Keyword(s):  
Silicon Wafer ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
Wafer Surface ◽  
X Ray ◽  
Silicon Wafer Surface

How to Use the Features of Total Reflection of X-Rays for Energy Dispersive XRF

1988 ◽  
Vol 32 ◽  
pp. 105-114 ◽  
Author(s):  
H. Schwenke ◽  
W. Berneike ◽  
J. Knoth ◽  
U. Weisbrod
Keyword(s):  
Thin Films ◽  
Penetration Depth ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
X Rays ◽  
X Ray ◽  
Characteristic Features ◽  
Respective Characteristic ◽  
Nanometer Regime ◽  
Sensitive Method

AbstractThe total reflection of X-rays is mainly determined by three parameters , that is the orltical angle, the reflectivity and the penetration depth. For X-ray fluorescence analysis the respective characteristic features can be exploited in two rather different fields of application. In the analysis of trace elements in samples placed as thin films on optical flats, detection limits as low as 2 pg or 0.05 ppb, respectively, have been obtained. In addition, a penetration depth in the nanometer regime renders Total Reflection XRF an inherently sensitive method for the elemental analysis of surfaces. This paper outlines the main physical and constructional parameters for instrumental design and quantitation in both branches of TXRF.

Selective Mercury Determination after Membrane Complexation and Total Reflection X-ray Fluorescence Analysis

2004 ◽  
Vol 76 (15) ◽  
pp. 4315-4319 ◽  
Author(s):  
Pavlos E. Koulouridakis ◽  
Nikolaos G. Kallithrakas-Kontos
Keyword(s):  
Fluorescence Analysis ◽  
Total Reflection ◽  
Mercury Determination ◽  
X Ray

Trace Element Determination in Diesel Particulates by Total-Reflection X-Ray Fluorescence Analysis

1999 ◽  
Vol 131 (3-4) ◽  
pp. 219-223 ◽  
Author(s):  
Juha K. Vilhunen ◽  
Alex von Bohlen ◽  
Martina Schmeling ◽  
Leena Rantanen ◽  
Seppo Mikkonen ◽  
...  
Keyword(s):  
Trace Element ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
Trace Element Determination ◽  
Element Determination ◽  
X Ray

Main Peak Profiles of Total Reflection X-Ray Fluorescence Analysis of Si(001) Wafers Excited by Monochromatic X-Ray Beam W-Lβ (II)

1993 ◽  
Vol 32 (Part 1, No. 3A) ◽  
pp. 1191-1196 ◽  
Author(s):  
Kenji Yakushiji ◽  
Shinji Ohkawa ◽  
Atsushi Yoshinaga ◽  
Jimpei Harada
Keyword(s):  
Fluorescence Analysis ◽  
Total Reflection ◽  
Main Peak ◽  
X Ray
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