Field emission of polycrystalline diamond films grown by microwave-plasma chemical vapor deposition. I. Effects of surface morphology of diamond

Diamond and Related Materials ◽

10.1016/s0925-9635(02)00186-3 ◽

2002 ◽

Vol 11 (12) ◽

pp. 1897-1904 ◽

Author(s):

Takayuki Toyama ◽

Yasuo Koide ◽

Masanori Murakami

Keyword(s):

Chemical Vapor Deposition ◽

Surface Morphology ◽

Field Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Field emission of polycrystalline diamond films grown by microwave plasma chemical vapor deposition. II. Effect of p-type doping in diamond

Diamond and Related Materials ◽

10.1016/s0925-9635(01)00488-5 ◽

2001 ◽

Vol 10 (12) ◽

pp. 2118-2124 ◽

Author(s):

Masatsugu Itahashi ◽

Yasunobu Umehara ◽

Yasuo Koide ◽

Masanori Murakami

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Field-emission characteristics of diamond films deposited by microwave plasma chemical vapor deposition

10.1117/12.319667 ◽

1998 ◽

Author(s):

Hong Ji ◽

Zengsun Jin ◽

Changzhi Gu ◽

Xianyi Lu ◽

Guangtian Zhou ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Emission Characteristics ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Electron field emission from undoped polycrystalline diamond particles synthesized by microwave-plasma chemical vapor deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3670988 ◽

2012 ◽

Vol 30 (1) ◽

pp. 011204 ◽

Author(s):

Kenji Nose ◽

Ryuhei Fujita ◽

Masao Kamiko ◽

Yoshitaka Mitsuda

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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[100]-textured growth of polycrystalline diamond films on alumina substrates by microwave plasma chemical vapor deposition

Materials Letters ◽

10.1016/j.matlet.2006.01.009 ◽

2006 ◽

Vol 60 (19) ◽

pp. 2390-2394 ◽

Author(s):

Linjun Wang ◽

Jinfang Lu ◽

Qingfeng Su ◽

Nanchun Wu ◽

Jianmin Liu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Growth of Si-Doped Polycrystalline Diamond Films on AlN Substrates by Microwave Plasma Chemical Vapor Deposition

Journal of Coating Science and Technology ◽

10.6000/2369-3355.2015.02.02.1 ◽

2015 ◽

pp. 38-45 ◽

Author(s):

V.S. Sedov ◽

◽

A.A. Khomich ◽

V.G. Ralchenko ◽

A.K. Martyanov ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Surface analysis of boron-doped polycrystalline diamond films deposited by a microwave plasma chemical vapor deposition system

Materials Chemistry and Physics ◽

10.1016/s0254-0584(99)00036-x ◽

1999 ◽

Vol 59 (2) ◽

pp. 143-148 ◽

Author(s):

B.R Huang ◽

C.H Wu ◽

W.Z Ke

Keyword(s):

Chemical Vapor Deposition ◽

Surface Analysis ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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The effect of pressure on growth rate and quality of diamond films prepared by microwave plasma chemical vapor deposition

Acta Physica Sinica ◽

10.7498/aps.56.7183 ◽

2007 ◽

Vol 56 (12) ◽

pp. 7183

Author(s):

物理学报

Keyword(s):

Growth Rate ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Effect Of Pressure

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Deposition of smooth, oriented diamond films using microwave plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/0040-6090(92)90512-a ◽

1992 ◽

Vol 212 (1-2) ◽

pp. 140-149 ◽

Author(s):

F.G. Celii ◽

D. White ◽

A.J. Purdes

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Field emission properties of carbon nitride synthesized by microwave plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2018.12.030 ◽

2019 ◽

Vol 671 ◽

pp. 53-58

Author(s):

Ippei Tanaka ◽

Koudai Yarita ◽

Yukihiro Sakamoto

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Emission Properties ◽

Plasma Chemical Vapor Deposition ◽

Field Emission Properties

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Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

Diamond and Related Materials ◽

10.1016/j.diamond.2005.11.011 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1484-1491 ◽

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

M.P.M. Kivitorma ◽

I.J. Vayrynen ◽

T. Aoki

Keyword(s):

Chemical Vapor Deposition ◽

Surface Morphology ◽

Vapor Deposition ◽

Chemical Structure ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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