Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

2006 ◽  
Vol 15 (9) ◽  
pp. 1484-1491 ◽  
Author(s):  
I. Blaszczyk-Lezak ◽  
A.M. Wrobel ◽  
M.P.M. Kivitorma ◽  
I.J. Vayrynen ◽  
T. Aoki
Keyword(s):  
Chemical Vapor Deposition ◽  
Surface Morphology ◽  
Vapor Deposition ◽  
Chemical Structure ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Silicon Carbonitride ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition

1993 ◽  
Vol 32 (Part 2, No. 7B) ◽  
pp. L987-L989 ◽  
Author(s):  
Yusuke Mori ◽  
Yoshiyuki Show ◽  
Masahiro Deguchi ◽  
Hiromasa Yagi ◽  
Hiroyuki Yagyu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Diamond Layer
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