MBE growth of ferromagnetic single crystal Heusler alloys on (0 0 1)Ga1−xInxAs

2001 ◽  
Vol 10 (1-3) ◽  
pp. 428-432 ◽  
Author(s):  
J.W. Dong ◽  
J. Lu ◽  
J.Q. Xie ◽  
L.C. Chen ◽  
R.D. James ◽  
...  
2021 ◽  
Vol 118 (9) ◽  
pp. 092101
Author(s):  
Kevin Lee ◽  
Ryan Page ◽  
Vladimir Protasenko ◽  
Leo J. Schowalter ◽  
Masato Toita ◽  
...  

1998 ◽  
Vol 537 ◽  
Author(s):  
Zhonghai Yu ◽  
M.A.L. Johnson ◽  
J.D. Brown ◽  
N.A. El-Masry ◽  
J. F. Muth ◽  
...  

AbstractThe epitaxial lateral overgrowth (ELO) process for GaN has been studied using SiC and sapphire substrates. Both MBE and MOVPE growth processes were employed in the study. The use of SiO2 versus SiNx insulator stripes was investigated using window/stripe widths ranging from 2 μm/4 μm to 3 μm/15 μm. GaN film depositions were completed at temperatures ranging from 800°C to 1120°C. Characterization experiments included RHEED, TEM, SEM and cathodolumenescence studies. The MBE growth experiments produced polycrystalline GaN over the insulator stripes even at deposition temperatures as high as 990°C. In contrast, MOVPE growth produced single-crystal GaN stripes with no observable threading dislocations.


1987 ◽  
Vol 81 (1-4) ◽  
pp. 524-529 ◽  
Author(s):  
B.T. Jonker ◽  
J.J. Krebs ◽  
G.A. Prinz ◽  
S.B. Qadri
Keyword(s):  

2014 ◽  
Vol 47 (42) ◽  
pp. 425002 ◽  
Author(s):  
V V Sokolovskiy ◽  
O Pavlukhina ◽  
V D Buchelnikov ◽  
P Entel

2001 ◽  
Vol 37 (4) ◽  
pp. 2176-2178 ◽  
Author(s):  
S.F. Cheng ◽  
B. Nadgomy ◽  
K. Bussmann ◽  
E.E. Carpenter ◽  
B.N. Das ◽  
...  

1999 ◽  
Vol 4 (S1) ◽  
pp. 447-452
Author(s):  
Zhonghai Yu ◽  
M.A.L. Johnson ◽  
J.D. Brown ◽  
N.A. El-Masry ◽  
J. F. Muth ◽  
...  

The epitaxial lateral overgrowth (ELO) process for GaN has been studied using SiC and sapphire substrates. Both MBE and MOVPE growth processes were employed in the study. The use of SiO2 versus SiNx insulator stripes was investigated using window/stripe widths ranging from 20 μm/4 μm to 3 μm/15 μm. GaN film depositions were completed at temperatures ranging from 800 °C to 1120 °C. Characterization experiments included RHEED, TEM, SEM and cathodolumenescence studies. The MBE growth experiments produced polycrystalline GaN over the insulator stripes even at deposition temperatures as high as 990 °C. In contrast, MOVPE growth produced single-crystal GaN stripes with no observable threading dislocations.


2020 ◽  
Vol 116 (26) ◽  
pp. 262102
Author(s):  
Kevin Lee ◽  
YongJin Cho ◽  
Leo J. Schowalter ◽  
Masato Toita ◽  
Huili Grace Xing ◽  
...  

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