Complementary Charge Trapping and Ionic Migration in Resistive Switching of Rare-Earth Manganite TbMnO3

2013 ◽  
Vol 5 (4) ◽  
pp. 1213-1217 ◽  
Author(s):  
Yimin Cui ◽  
Haiyang Peng ◽  
Shuxiang Wu ◽  
Rongming Wang ◽  
Tom Wu
2005 ◽  
Vol 275 (1-2) ◽  
pp. e163-e167 ◽  
Author(s):  
Nilotpal Ghosh ◽  
B. Padmanabhan ◽  
Suja Elizabeth ◽  
H.L. Bhat

2005 ◽  
Vol 108-109 ◽  
pp. 755-760 ◽  
Author(s):  
Wolfgang Skorupa ◽  
J.M. Sun ◽  
S. Prucnal ◽  
L. Rebohle ◽  
T. Gebel ◽  
...  

Using ion implantation different rare earth luminescent centers (Gd3+, Tb3+, Eu3+, Ce3+, Tm3+, Er3+) were formed in the silicon dioxide layer of a purpose-designed Metal Oxide Silicon (MOS) capacitor with advanced electrical performance, further called a MOS-light emitting device (MOSLED). Efficient electroluminescence was obtained for the wavelength range from UV to infrared with a transparent top electrode made of indium-tin oxide. Top values of the efficiency of 0.3 % corresponding to external quantum efficiencies distinctly above the percent range were reached. The electrical properties of these devices such as current-voltage and charge trapping characteristics, were also evaluated. Finally, application aspects to the field of biosensing will be shown.


2012 ◽  
Vol 48 (3) ◽  
pp. 1155-1158 ◽  
Author(s):  
Reena Singh ◽  
Deepika Bhuwal ◽  
Rashmi Yadav ◽  
Subhash Khatarkar ◽  
Vilas Shelke

2018 ◽  
Vol 4 (2) ◽  
pp. 1800342 ◽  
Author(s):  
Shi-Rui Zhang ◽  
Li Zhou ◽  
Jing-Yu Mao ◽  
Yi Ren ◽  
Jia-Qin Yang ◽  
...  

2015 ◽  
Vol 1729 ◽  
pp. 23-28 ◽  
Author(s):  
Yogesh Sharma ◽  
Pankaj Misra ◽  
Shojan P. Pavunny ◽  
Ram S. Katiyar

ABSTRACTRare-earth oxides have attracted considerable research interest in resistive random access memories (ReRAMs) due to their compatibility with complementary metal-oxide semiconductor (CMOS) process. To this end we report unipolar resistive switching in a novel ternary rare-earth oxide LaHoO3 (LHO) to accelerate progress and to support advances in this emerging densely scalable research architecture. Amorphous thin films of LHO were fabricated on Pt/TiO2/SiO2/Si substrate by pulsed laser deposition, followed by sputter deposition of platinum top electrode through shadow mask in order to elucidate the resistive switching behavior of the resulting Pt/LHO/Pt metal-insulator-metal (MIM) device structure. Stable unipolar resistive switching characteristics with interesting switching parameters like, high resistance ratio of about 105 between high resistance state (HRS) and low resistance state (LRS), non-overlapping switching voltages with narrow dispersion, and excellent retention and endurance features were observed in Pt/LHO/Pt device structure. The observed resistive switching in LHO was explained by the formation/rupture of conductive filaments formed out of oxygen vacancies and metallic Ho atom. From the current-voltage characteristics of Pt/LHO/Pt structure, the conduction mechanism in LRS and HRS was found to be dominated by Ohm’s law and Poole-Frenkel emission, respectively.


2011 ◽  
Vol 84 (6) ◽  
Author(s):  
Joel S. Helton ◽  
Deepak K. Singh ◽  
Harikrishnan S. Nair ◽  
Suja Elizabeth

2005 ◽  
Vol 293 (3) ◽  
pp. 872-879 ◽  
Author(s):  
Sudipta Pal ◽  
Esa Bose ◽  
B.K. Chaudhuri ◽  
H.D. Yang ◽  
S. Neeleshwar ◽  
...  

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