Atomic Layer Deposition of Yttria-Stabilized Zirconia for Solid Oxide Fuel Cells

2007 ◽  
Vol 19 (15) ◽  
pp. 3850-3854 ◽  
Author(s):  
Joon Hyung Shim ◽  
Cheng-Chieh Chao ◽  
Hong Huang ◽  
Fritz B. Prinz
Keyword(s):  
Fuel Cells ◽  
Atomic Layer Deposition ◽  
Solid Oxide Fuel Cells ◽  
Atomic Layer ◽  
Solid Oxide ◽  
Yttria Stabilized Zirconia ◽  
Oxide Fuel ◽  
Stabilized Zirconia ◽  
Layer Deposition

Atomic layer deposition of yttria-stabilized zirconia thin films for enhanced reactivity and stability of solid oxide fuel cells

Energy ◽  
2016 ◽  
Vol 116 ◽  
pp. 170-176 ◽  
Author(s):  
Joonho Park ◽  
Yeageun Lee ◽  
Ikwhang Chang ◽  
Gu Young Cho ◽  
Sanghoon Ji ◽  
...  
Keyword(s):  
Thin Films ◽  
Fuel Cells ◽  
Atomic Layer Deposition ◽  
Solid Oxide Fuel Cells ◽  
Atomic Layer ◽  
Solid Oxide ◽  
Yttria Stabilized Zirconia ◽  
Oxide Fuel ◽  
Stabilized Zirconia ◽  
Layer Deposition

Behavior of La0.6sr 0.4Co0.2Fe0.2O3-  Cathode Powders Surface Modified by Atomic Layer Deposition for Solid Oxide Fuel Cells

2016 ◽  
Vol 75 (6) ◽  
pp. 195-202 ◽  
Author(s):  
J. F. Roeder ◽  
A. F. Zeberoff ◽  
P. C. Van Buskirk ◽  
A. Torabi ◽  
J. Barton ◽  
...  
Keyword(s):  
Fuel Cells ◽  
Atomic Layer Deposition ◽  
Solid Oxide Fuel Cells ◽  
Atomic Layer ◽  
Solid Oxide ◽  
Oxide Fuel ◽  
Layer Deposition ◽  
Surface Modified

Tunability of Atomic Layer Deposition of Yttria-Stabilized Zirconium Oxide for use in Solid Oxide Fuel Cells

2013 ◽  
Vol 6 (1) ◽  
Author(s):  
A. Walter ◽  
R. Xu ◽  
G. Jursich ◽  
C.G. Takoudis
Keyword(s):  
Fuel Cells ◽  
Atomic Layer Deposition ◽  
Solid Oxide Fuel Cells ◽  
Photoelectron Spectroscopy ◽  
Zirconium Oxide ◽  
Atomic Layer ◽  
Solid Oxide ◽  
Oxide Fuel ◽  
Spectral Ellipsometry ◽  
Layer Deposition

Thin films of yttria-stabilized zirconium oxide (YSZ) were successfully deposited using atomic layer deposition (ALD) for use in solid oxide fuel cells (SOFCs). YSZ was deposited on p-Si(100) by ALD using Tris(isopropyl-cyclopentadienyl)yttrium [(iPrCp)3Y] and tris(dimethylamino)cyclopentadienylzirconim [ZyALD] as metal precursors and ozone as oxidant. The normalized ALD cycle ratio of yttria cycles / total cycles used in making these films was varied to investigate the tunability of this process. Spectral ellipsometry was used to measure the thickness of the films. X-ray photoelectron spectroscopy (XPS) analyses were used to evaluate the composition and binding environments of as-deposited YSZ films. The normalized cycle ratio and the yttrium atomic percentage (Y atoms / metal atoms) have a linear relationship with a strong correlation, implying excellent tunability for this process. The binding environment analyses determine the oxidation state of the metals and show that decreasing the cycle ratio decreases the extent of yttrium hydroxidation.

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