Chemical Approach to High-Resolution Patterning on Self-Assembled Monolayers Using Atomic Force Microscope Lithography
2002 ◽
Vol 16
(7)
◽
pp. 845-868
◽
2003 ◽
Vol 21
(6)
◽
pp. 2398
◽
2009 ◽
Vol 52
(1-3)
◽
pp. 103-106
◽
Keyword(s):
Keyword(s):