Reactive Epoxy-Functionalized Thin Films by a Pulsed Plasma Polymerization Process

Langmuir ◽  
2008 ◽  
Vol 24 (18) ◽  
pp. 10187-10195 ◽  
Author(s):  
Benjamin Thierry ◽  
Marek Jasieniak ◽  
Louis C. P. M. de Smet ◽  
Krasimir Vasilev ◽  
Hans J. Griesser
2016 ◽  
Vol 91 (12) ◽  
pp. 125501 ◽  
Author(s):  
Aviraj A Jatratkar ◽  
Jyotiprakash B Yadav ◽  
R R Deshmukh ◽  
Harish C Barshilia ◽  
Vijaya Puri ◽  
...  

2009 ◽  
Vol 7 (2) ◽  
pp. 172-181 ◽  
Author(s):  
Laurent Denis ◽  
Philippe Marsal ◽  
Yoann Olivier ◽  
Thomas Godfroid ◽  
Roberto Lazzaroni ◽  
...  

Author(s):  
Marisol Ji ◽  
Andrea Jagodar ◽  
Eva Kovacevic ◽  
Lazhar Benyahia ◽  
Fabienne Poncin-Epaillard

1998 ◽  
Vol 84 (1) ◽  
pp. 439-444 ◽  
Author(s):  
Licheng M. Han ◽  
Richard B. Timmons ◽  
Wei W. Lee ◽  
Yuanye Chen ◽  
Zhibing Hu

1998 ◽  
Vol 31 (22) ◽  
pp. 7618-7626 ◽  
Author(s):  
Megan A. Leich ◽  
Neil M. Mackie ◽  
Keri L. Williams ◽  
Ellen R. Fisher

1998 ◽  
Vol 544 ◽  
Author(s):  
Shinzo Morita ◽  
Shinji Ogawa ◽  
Mikinori Suzuki ◽  
Md. Abul Kashem

AbstractPlasma graft polymerized styrene was formed by a reactor with a parallel plate electrode system on a pulsed plasma polymerized styrene film in a monomer vapor, where the pulsed plasma polymerization was performed by a low frequency 100%pulse modulation of 13.56 MHz power source in styrene vapor. The pulse duration was varied in the range of 0.01∼1 sec and ON time/duty cycle ratio was 1/10 and 1/20. The processes were monitored by a quartz crystal microbalance. The initial stage of plasma polymerization and grafting are discussed in this paper. Also sub 100 nm lines and spaces pattern on the resist delineated by an electron-beam pattering machine was developed by hexane.


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