Chapter 8. Synthesis Techniques for Ultrathin Oxide Layers of Heterogeneous Catalysts

2022 ◽  
pp. 210-235
Author(s):  
Zheng Lu ◽  
Jeffrey W. Elam
Keyword(s):  
Heterogeneous Catalysts ◽  
Oxide Layers ◽  
Synthesis Techniques ◽  
Ultrathin Oxide

Atomically Smooth Ultrathin Oxide Layers on SI(113)

1999 ◽  
Vol 567 ◽  
Author(s):  
H.-J. Müssig ◽  
J. Dabrowski ◽  
S. Hinrich
Keyword(s):  
Elevated Temperatures ◽  
Oxidation Mechanism ◽  
Dissociative Chemisorption ◽  
Initial Oxidation ◽  
Precursor State ◽  
Oxide Layers ◽  
Adsorption Sites ◽  
Molecular Precursor ◽  
Diffusion Paths ◽  
Ultrathin Oxide

ABSTRACTWe report the first direct observation of dissociative chemisorption of oxygen molecules on a silicon surface at room temperature via a molecular precursor state. We link this to the fact that smooth oxide layers can be grown easily on Si(113). The process of initial oxidation is discussed in terms of surface diffusion paths and surface stress. First ab initiocalculations help elucidate the favored adsorption sites and the oxidation mechanism. Experimental evidence was found for bond geometries resulting in the quasi-epitaxial growth of a chemisorption layer on the substrate at elevated temperatures (600°C). In contrast to the first stages of Si(001) oxidation, neither defects nor the ejection of Si atoms plays a significant role during the initial oxidation of Si(113).

Photoconductivity of Macroporous and Nonporous Silicon with Ultrathin Oxide Layers

2018 ◽  
Vol 47 (9) ◽  
pp. 5105-5108 ◽  
Author(s):  
K. P. Konin ◽  
Yu. V. Goltvyansky ◽  
L. A. Karachevtseva ◽  
M. I. Karas ◽  
D. V. Morozovs’ka
Keyword(s):  
Oxide Layers ◽  
Ultrathin Oxide

Structure of ultrathin oxide layers on metal surfaces from grazing scattering of fast atoms

2009 ◽  
Vol 256 (2) ◽  
pp. 365-370 ◽  
Author(s):  
H. Winter ◽  
J. Seifert ◽  
D. Blauth ◽  
M. Busch ◽  
A. Schüller ◽  
...  
Keyword(s):  
Metal Surfaces ◽  
Oxide Layers ◽  
Grazing Scattering ◽  
Ultrathin Oxide

Void formation during thermal decomposition of ultrathin oxide layers on the Si(110) surface

1998 ◽  
Vol 398 (1-2) ◽  
pp. 134-142 ◽  
Author(s):  
Ken Fujita ◽  
Heiji Watanabe ◽  
Masakazu Ichikawa
Keyword(s):  
Thermal Decomposition ◽  
Void Formation ◽  
Oxide Layers ◽  
Ultrathin Oxide

On the properties of the gate and substrate current after soft breakdown in ultrathin oxide layers

1998 ◽  
Vol 45 (11) ◽  
pp. 2329-2334 ◽  
Author(s):  
F. Crupi ◽  
R. Degraeve ◽  
G. Groeseneken ◽  
T. Nigam ◽  
H.E. Maes
Keyword(s):  
Oxide Layers ◽  
Substrate Current ◽  
Soft Breakdown ◽  
Ultrathin Oxide
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