Homoleptic Gadolinium Guanidinate: A Single Source Precursor for Metal−Organic Chemical Vapor Deposition of Gadolinium Nitride Thin Films

Journal of the American Chemical Society ◽

10.1021/ja907952g ◽

2009 ◽

Vol 131 (47) ◽

pp. 17062-17063 ◽

Author(s):

Andrian P. Milanov ◽

Tobias B. Thiede ◽

Anjana Devi ◽

Roland A. Fischer

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Gadolinium Nitride ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal−Organic Chemical Vapor Deposition

Chemistry of Materials ◽

10.1021/cm9905040 ◽

1999 ◽

Vol 11 (12) ◽

pp. 3430-3432 ◽

Author(s):

Mike R. Lazell ◽

Paul O'Brien ◽

David J. Otway ◽

Jin-Ho Park

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Gallium Sulfide ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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ChemInform Abstract: Metal-Organic Chemical Vapor Deposition of Semiconducting III/VI In2Se3 Thin Films from the Single-Source Precursor: In(SeC(SiMe3)3)3.

10.1002/chin.199612269 ◽

2010 ◽

Vol 27 (12) ◽

pp. no-no

Author(s):

J. CHEON ◽

J. ARNOLD ◽

K.-M. YU ◽

E. D. BOURRET

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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ChemInform Abstract: Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal-Organic Chemical Vapor Deposition.

10.1002/chin.200011022 ◽

2010 ◽

Vol 31 (11) ◽

pp. no-no

Author(s):

Mike R. Lazell ◽

Paul O'Brien ◽

David J. Otway ◽

Jin-Ho Park

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Gallium Sulfide ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Deposition of Bismuth Chalcogenide Thin Films Using Novel Single-Source Precursors by Metal-Organic Chemical Vapor Deposition.

10.1002/chin.200443025 ◽

2004 ◽

Vol 35 (43) ◽

Author(s):

John Waters ◽

David Crouch ◽

James Raftery ◽

Paul O'Brien

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursors ◽

Metal Organic ◽

Chalcogenide Thin Films ◽

Organic Chemical Vapor Deposition

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La2S3thin films from metal organic chemical vapor deposition of single-source precursor

Journal of Materials Chemistry ◽

10.1039/b511981b ◽

2006 ◽

Vol 16 (3) ◽

pp. 272-277 ◽

Author(s):

Lu Tian ◽

Ti Ouyang ◽

Kian Ping Loh ◽

Jagadese J. Vittal

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Deposition of Bismuth Chalcogenide Thin Films Using Novel Single-Source Precursors by Metal-Organic Chemical Vapor Deposition

Chemistry of Materials ◽

10.1021/cm035287o ◽

2004 ◽

Vol 16 (17) ◽

pp. 3289-3298 ◽

Author(s):

John Waters ◽

David Crouch ◽

James Raftery ◽

Paul O'Brien

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursors ◽

Metal Organic ◽

Chalcogenide Thin Films ◽

Organic Chemical Vapor Deposition

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Comparative Study of the Metal Organic Chemical Vapor Deposition of β-CoGa Thin Films from Dialkylgallium Tetracarbonylcobaltate Single-Source Precursors

Chemistry of Materials ◽

10.1021/cm9504044 ◽

1996 ◽

Vol 8 (2) ◽

pp. 497-508 ◽

Author(s):

Roland A. Fischer ◽

Alexander Miehr

Keyword(s):

Chemical Vapor Deposition ◽

Comparative Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursors ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Metal-organic chemical vapor deposition of indium selenide films using a single-source precursor

Materials Science and Engineering B ◽

10.1016/j.mseb.2004.05.044 ◽

2005 ◽

Vol 116 (3) ◽

pp. 391-394 ◽

Author(s):

Mohammad Afzaal ◽

David Crouch ◽

Paul O’Brien

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Indium Selenide ◽

Organic Chemical ◽

Single Source ◽

Single Source Precursor ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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ChemInform Abstract: Heteroepitaxy of LaAlO3 (100) on SrTiO3 (100): In situ Growth of LaAlO3 Thin Films by Metal-Organic Chemical Vapor Deposition from a Liquid Single Source.

10.1002/chin.199909021 ◽

2010 ◽

Vol 30 (9) ◽

pp. no-no

Author(s):

Graziella Malandrino ◽

Ignazio L. Fragala ◽

Paolo Scardi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

In Situ Growth ◽

Single Source ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Growth of gallium oxide thin films on silicon by the metal organic chemical vapor deposition method

Materials Science and Engineering B ◽

10.1016/j.mseb.2004.01.012 ◽

2004 ◽

Vol 110 (1) ◽

pp. 34-37 ◽

Author(s):

Hyoun Woo Kim ◽

Nam Ho Kim

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Gallium Oxide ◽

Chemical Vapor ◽

Organic Chemical ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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