Atomic level changes during capacity fade in highly oriented thin films of cathode material LiCoPO4

2017 ◽  
Vol 5 (19) ◽  
pp. 9329-9338 ◽  
Author(s):  
Yumi H. Ikuhara ◽  
Xiang Gao ◽  
Craig A. J. Fisher ◽  
Akihide Kuwabara ◽  
Hiroki Moriwake ◽  
...  

High-quality thin films of cathode material LiCoPO4 are analyzed using a combination of STEM-EELS, XRD, and atomistic simulations. Capacity fade during cycling is accompanied by formation of large numbers of cation exchange defects, especially at surfaces, blocking the preferred Li-ion migration pathways.

2015 ◽  
Vol 3 (32) ◽  
pp. 8364-8371 ◽  
Author(s):  
T. S. Tripathi ◽  
Janne-Petteri Niemelä ◽  
Maarit Karppinen

Atomic layer deposition (ALD) is a vital gas-phase technique for atomic-level thickness-controlled deposition of high-quality thin films of CuCrO2 on various substrate morphologies owing to its self-limiting gas-surface reaction mechanism.


2019 ◽  
Vol 7 (41) ◽  
pp. 23922-23930 ◽  
Author(s):  
Yuwei Zhang ◽  
Yuting Luo ◽  
Cole Fincher ◽  
Sarbajit Banerjee ◽  
Matt Pharr

We have devised an approach to fabricate dense textured V2O5 thin films, which allows us to scrutinize the root cause of capacity fade in V2O5 cathodes of Li-ion batteries.


Sign in / Sign up

Export Citation Format

Share Document