Hollow silicon microneedle fabrication using advanced plasma etch technologies for applications in transdermal drug delivery
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A novel production process flow is presented for the manufacture of hollow silicon microneedles using deep reactive-ion etching (DRIE) technology.
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2011 ◽
Vol 21
(10)
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pp. 105001
1999 ◽
Vol 8
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pp. 152-160
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2014 ◽
Vol 113
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pp. 35-39
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2018 ◽
Vol 283
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pp. 65-78
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2002 ◽
Vol 11
(3)
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pp. 264-275
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2006 ◽
Vol 16
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pp. 2570-2575
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