scholarly journals Solvent manipulation of the pre-reduction metal–ligand complex and particle-ligand binding for controlled synthesis of Pd nanoparticles

Nanoscale ◽  
2021 ◽  
Vol 13 (1) ◽  
pp. 206-217
Author(s):  
Wenhui Li ◽  
Michael G. Taylor ◽  
Dylan Bayerl ◽  
Saeed Mozaffari ◽  
Mudit Dixit ◽  
...  

Understanding how to control the nucleation and growth rates is crucial for designing nanoparticles with specific sizes and shapes.

2016 ◽  
Vol 52 (9) ◽  
pp. 1863-1866 ◽  
Author(s):  
Tania L. Read ◽  
Maxim B. Joseph ◽  
Julie V. Macpherson

Boron doped diamond generator-detector electrodes can both change and monitor the binding state of the pH sensitive metal–ligand complex [Cu2+:TETA] by locally varying pH and measuring the free metal concentration.


Author(s):  
Johnson Dalmieda ◽  
Ana Zubiarrain-Laserna ◽  
Dipankar Saha ◽  
Ponnambalam Ravi Selvaganapathy ◽  
Peter Kruse

Polymers ◽  
2017 ◽  
Vol 9 (12) ◽  
pp. 144 ◽  
Author(s):  
Dasom Park ◽  
Chaeyeon Lee ◽  
Minsu Chae ◽  
Mohammad Kadir ◽  
Ji Choi ◽  
...  

2011 ◽  
Vol 1308 ◽  
Author(s):  
Andreas Bill ◽  
Ralf B. Bergmann

ABSTRACTWe present an overview of the theory developed over the last few years to describe the crystallization of amorphous solids. The microstructure of the crystallizing solid is described in terms of the grain size distribution (GSD). We propose a partial differential equation that captures the physics of crystallization in random nucleation and growth processes. The analytic description is derived for isotropic and anisotropic growth rates and allows for the analysis of different stages of crystallization, from early to full crystallization. We show how the timedependence of effective nucleation and growth rates affect the final distribution. In particular, we demonstrate that for cases described by the Kolmogorov-Avrami-Mehl-Johnson (KAMJ) model applicable to a large class of crystallization processes a lognormal type distribution is obtained at full crystallization. The application of the theory to the crystallization of silicon thin films is discussed.


1997 ◽  
Vol 350 (1-2) ◽  
pp. 37-50 ◽  
Author(s):  
J.F. van Staden ◽  
C. Saling ◽  
D. Malan ◽  
R.E. Taljaard

1995 ◽  
Vol 232 (1) ◽  
pp. 24-30 ◽  
Author(s):  
Hee Ju Youn ◽  
Ewald Terpetschnig ◽  
Henryk Szmacinski ◽  
Joseph R. Lakowicz

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