CW room-temperature visible single quantum well Ga0.73Al0.27As diode lasers grown by metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:19820345 ◽

1982 ◽

Vol 18 (12) ◽

pp. 507 ◽

Author(s):

R.D. Burnham ◽

D.R. Scifres ◽

W. Streifer

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Diode Lasers ◽

Chemical Vapour ◽

Single Quantum ◽

Single Quantum Well ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Long wavelength room temperature laser operation of a strained InGaAs/GaAs quantum well structure monolithically grown by metalorganic chemical vapour deposition on a low energy-plasma enhanced chemical vapour deposition graded misoriented Ge/Si virtual substrate

Optical Materials ◽

10.1016/j.optmat.2004.08.022 ◽

2005 ◽

Vol 27 (5) ◽

pp. 846-850 ◽

Author(s):

Y. Chriqui ◽

G. Saint-Girons ◽

G. Isella ◽

H. von Kaenel ◽

S. Bouchoule ◽

...

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour ◽

Laser Operation ◽

Long Wavelength ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Room temperature CW operation of GaInAsP/InP double-heterostructure diode lasers emitting at 1.23 μm grown by low-pressure metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:19810420 ◽

1981 ◽

Vol 17 (17) ◽

pp. 597 ◽

Author(s):

M. Razeghi ◽

J.P. Hirtz ◽

P. Hirtz ◽

J.P. Larivain ◽

R. Bondeau ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Diode Lasers ◽

Chemical Vapour ◽

Low Pressure ◽

Double Heterostructure ◽

Cw Operation ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Room temperature CW operation of GaInAsP/InP double heterostructure diode lasers emitting at 1.5 μm grown by low pressure metalorganic chemical vapour deposition (LP-MO CVD)

Electronics Letters ◽

10.1049/el:19820088 ◽

1982 ◽

Vol 18 (3) ◽

pp. 132 ◽

Author(s):

M. Razeghi ◽

P. Hirtz ◽

R. Blondeau ◽

J.P. Larivain ◽

L. Noel ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Diode Lasers ◽

Chemical Vapour ◽

Low Pressure ◽

Double Heterostructure ◽

Cw Operation ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Room-Temperature Ferromagnetism of Ga 1− x Mn x N Grown by Low-Pressure Metalorganic Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/23/5/061 ◽

2006 ◽

Vol 23 (5) ◽

pp. 1286-1288 ◽

Author(s):

Chen Zhi-Tao ◽

Su Yue-Yong ◽

Yang Zhi-Jian ◽

Zhang Yan ◽

Zhang Bin ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Room Temperature Ferromagnetism ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Effect of Al Doping in the InGaN/GaN Multiple Quantum Well Light Emitting Diodes Grown by Metalorganic Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/23/1/074 ◽

2006 ◽

Vol 23 (1) ◽

pp. 256-258 ◽

Author(s):

Lu Yu ◽

Yang Zhi-Jian ◽

Pan Yao-Bo ◽

Xu Ke ◽

Hu Xiao-Dong ◽

...

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Multiple Quantum Well ◽

Chemical Vapour ◽

Multiple Quantum ◽

Al Doping ◽

Light Emitting ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Room temperature formation of rhodium nanoparticles on TiO2[110] via MetalOrganic Chemical-Vapour Deposition (MOCVD) of [Rh(CO)2Cl]2

Chemical Communications ◽

10.1039/b003782f ◽

2000 ◽

pp. 1677-1678 ◽

Author(s):

Mark A. Newton ◽

John Evans ◽

Roger A. Bennett ◽

Rupert D. Smith ◽

Michael Bowker

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour ◽

Rhodium Nanoparticles ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Structural, electrical and optical properties of Si delta-doped Al0.27Ga0.73As/GaAs single quantum wells grown by metalorganic chemical vapour deposition

Semiconductor Science and Technology ◽

10.1088/0268-1242/9/10/012 ◽

1994 ◽

Vol 9 (10) ◽

pp. 1823-1826 ◽

Author(s):

T W Kim ◽

Y Kim ◽

S -K Min ◽

J Y Lee ◽

S J Lee

Keyword(s):

Optical Properties ◽

Quantum Wells ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Single Quantum ◽

Electrical And Optical Properties ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Magnetotransport and electric subband studies of Si-delta-doped Al0.27Ga0.73As/GaAs single quantum wells grown by metalorganic chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(94)06261-i ◽

1995 ◽

Vol 254 (1-2) ◽

pp. 61-64 ◽

Author(s):

T.W. Kim ◽

Y. Kim ◽

S.-K. Min

Keyword(s):

Quantum Wells ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Single Quantum ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Diffraction-coupled, phase-locked arrays of antiguided, quantum-well lasers grown by metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:19880652 ◽

1988 ◽

Vol 24 (15) ◽

pp. 958 ◽

Author(s):

L.J. Mawst ◽

D. Botez ◽

T.J. Roth ◽

G. Peterson ◽

J.J. Yang

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Quantum Well Lasers ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Comparison of chemical beam epitaxy and metalorganic chemical vapour deposition for highly strained multiple quantum well InGaAsP/InP 1.5 μm lasers

Journal of Crystal Growth ◽

10.1016/0022-0248(94)90383-2 ◽

1994 ◽

Vol 136 (1-4) ◽

pp. 56-63 ◽

Author(s):

D.C. Houghton ◽

M. Davies ◽

T. Sudersena Rao ◽

M. Dion

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Multiple Quantum Well ◽

Chemical Vapour ◽

Multiple Quantum ◽

Chemical Beam Epitaxy ◽

Metalorganic Chemical Vapour Deposition ◽

Highly Strained ◽

Metalorganic Chemical

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