Room temperature CW operation of GaInAsP/InP double-heterostructure diode lasers emitting at 1.23 μm grown by low-pressure metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:19810420 ◽

1981 ◽

Vol 17 (17) ◽

pp. 597 ◽

Author(s):

M. Razeghi ◽

J.P. Hirtz ◽

P. Hirtz ◽

J.P. Larivain ◽

R. Bondeau ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Diode Lasers ◽

Chemical Vapour ◽

Low Pressure ◽

Double Heterostructure ◽

Cw Operation ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Room temperature CW operation of GaInAsP/InP double heterostructure diode lasers emitting at 1.5 μm grown by low pressure metalorganic chemical vapour deposition (LP-MO CVD)

Electronics Letters ◽

10.1049/el:19820088 ◽

1982 ◽

Vol 18 (3) ◽

pp. 132 ◽

Author(s):

M. Razeghi ◽

P. Hirtz ◽

R. Blondeau ◽

J.P. Larivain ◽

L. Noel ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Diode Lasers ◽

Chemical Vapour ◽

Low Pressure ◽

Double Heterostructure ◽

Cw Operation ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Room-Temperature Ferromagnetism of Ga 1− x Mn x N Grown by Low-Pressure Metalorganic Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/23/5/061 ◽

2006 ◽

Vol 23 (5) ◽

pp. 1286-1288 ◽

Author(s):

Chen Zhi-Tao ◽

Su Yue-Yong ◽

Yang Zhi-Jian ◽

Zhang Yan ◽

Zhang Bin ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Room Temperature Ferromagnetism ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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CW room-temperature visible single quantum well Ga0.73Al0.27As diode lasers grown by metalorganic chemical vapour deposition

Electronics Letters ◽

10.1049/el:19820345 ◽

1982 ◽

Vol 18 (12) ◽

pp. 507 ◽

Author(s):

R.D. Burnham ◽

D.R. Scifres ◽

W. Streifer

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Diode Lasers ◽

Chemical Vapour ◽

Single Quantum ◽

Single Quantum Well ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Rapid thermal low-pressure metalorganic chemical vapour deposition of local diffused W(Zn) contacts

Semiconductor Science and Technology ◽

10.1088/0268-1242/8/7/040 ◽

1993 ◽

Vol 8 (7) ◽

pp. 1445-1450

Author(s):

A Katz ◽

A Feingold ◽

A El-Roy ◽

N Moriya ◽

S J Pearton ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Optical and electrical quality of InGaP grown on GaAs with low pressure metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(92)90347-l ◽

1992 ◽

Vol 125 (1-2) ◽

pp. 336-346 ◽

Author(s):

P.R. Hageman ◽

A. van Geelen ◽

W. Gabriëlse ◽

G.J. Bauhuis ◽

L.J. Giling

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Room temperature formation of rhodium nanoparticles on TiO2[110] via MetalOrganic Chemical-Vapour Deposition (MOCVD) of [Rh(CO)2Cl]2

Chemical Communications ◽

10.1039/b003782f ◽

2000 ◽

pp. 1677-1678 ◽

Author(s):

Mark A. Newton ◽

John Evans ◽

Roger A. Bennett ◽

Rupert D. Smith ◽

Michael Bowker

Keyword(s):

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour ◽

Rhodium Nanoparticles ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Growth of low-resistivity high-quality ZnSe, ZnS films by low-pressure metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(85)90110-1 ◽

1985 ◽

Vol 72 (1-2) ◽

pp. 13-16 ◽

Author(s):

A. Yoshikawa ◽

S. Yamaga ◽

K. Tanaka ◽

H. Kasai

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

High Quality ◽

Low Resistivity ◽

Metalorganic Chemical Vapour Deposition ◽

Zns Films ◽

Metalorganic Chemical

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Growth of FeS2 (pyrite) thin films on single crystalline substrates by low pressure metalorganic chemical vapour deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(94)00528-1 ◽

1995 ◽

Vol 146 (1-4) ◽

pp. 630-635 ◽

Author(s):

B. Thomas ◽

C. Höpfner ◽

K. Ellmer ◽

S. Fiechter ◽

H. Tributsch

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Single Crystalline ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical ◽

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Long wavelength room temperature laser operation of a strained InGaAs/GaAs quantum well structure monolithically grown by metalorganic chemical vapour deposition on a low energy-plasma enhanced chemical vapour deposition graded misoriented Ge/Si virtual substrate

Optical Materials ◽

10.1016/j.optmat.2004.08.022 ◽

2005 ◽

Vol 27 (5) ◽

pp. 846-850 ◽

Author(s):

Y. Chriqui ◽

G. Saint-Girons ◽

G. Isella ◽

H. von Kaenel ◽

S. Bouchoule ◽

...

Keyword(s):

Quantum Well ◽

Chemical Vapour Deposition ◽

Room Temperature ◽

Vapour Deposition ◽

Chemical Vapour ◽

Laser Operation ◽

Long Wavelength ◽

Metalorganic Chemical Vapour Deposition ◽

Metalorganic Chemical

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Growth of epitaxial and highly oriented thin films of cadmium and cadmium zinc sulfide by low-pressure metalorganic chemical vapour deposition using diethyldithiocarbamates

Journal of Crystal Growth ◽

10.1016/0022-0248(89)90662-3 ◽

1989 ◽

Vol 96 (4) ◽

pp. 989-992 ◽

Author(s):

Dario M. Frigo ◽

Omar F.Z. Khan ◽

Paul O'Brien

Keyword(s):

Zinc Sulfide ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Cadmium Zinc Sulfide ◽

Metalorganic Chemical Vapour Deposition ◽

Cadmium Zinc ◽

Metalorganic Chemical

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