Ion sources for ion implantation and ion beam modification of materials (invited)

1994 ◽  
Vol 65 (4) ◽  
pp. 1284-1289 ◽  
Author(s):  
Noriyuki Sakudo
Author(s):  
L.D. Yu ◽  
D. Suwannakachorn ◽  
S. Intarasiri ◽  
S. Thongtem ◽  
D. Boonyawan ◽  
...  

1985 ◽  
Vol 45 ◽  
Author(s):  
Kenji Gamo ◽  
Susumu Namba

Recent advances of focused ion beam systems and their applications are presented. The applications include maskless ion implantation and various maskless patterning techniques which make use of ion induced chemical effects. These are ion beam assisted etching, deposition and ion beam modification techniques and are promising to improve patterning speed and extend applications of focused ion beams.


1989 ◽  
Vol 154 ◽  
Author(s):  
P.H. Lu ◽  
R.A. Moody ◽  
I.H. Loh

AbstractInsulating polymeric sheets were made electrically conductive by ion implantation. The effects of implantation parameters, such as ion species, dose, energy, beam current density, and substrate temperature, on the resultant sheet resistivities were investigated. Surface structural changes of implanted polymers were evaluated by X-ray photoelectron spectroscopy (XPS), Rutherford backscattering spectroscopy (RBS), and Fourier transform infared spectroscopy (FTIR). Electron spin resonance (ESR) and temperature dependent resistivity measurements were performed to explore the conduction mechanisms of implanted polymers. The results indicate that ion beam modification of polymers proceeds via a similar mechanism as high temperature pyrolysis. The resultant carbon-enriched materials which can be described by the conducting grain model.


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