Solid‐state reaction in Pd/ZnSe thin film contacts

1995 ◽  
Vol 67 (7) ◽  
pp. 947-949 ◽  
Author(s):  
K. J. Duxstad ◽  
E. E. Haller ◽  
K. M. Yu ◽  
E. D. Bourret ◽  
J. M. Walker ◽  
...  
2021 ◽  
Vol 227 ◽  
pp. 111014
Author(s):  
Chien-Chung Hsu ◽  
Sheng-Min Yu ◽  
Kun-Mu Lee ◽  
Chuan-Jung Lin ◽  
Hao-Chien Cheng ◽  
...  

2015 ◽  
Vol 619 ◽  
pp. 325-331 ◽  
Author(s):  
H. Xu ◽  
V. Vuorinen ◽  
H. Dong ◽  
M. Paulasto-Kröckel

2013 ◽  
Vol 5 (4) ◽  
pp. 1310-1316 ◽  
Author(s):  
Chunhui Miao ◽  
Tongfei Shi ◽  
Guoping Xu ◽  
Shulin Ji ◽  
Changhui Ye

1994 ◽  
Vol 83 (1) ◽  
pp. 333-339 ◽  
Author(s):  
A. Paesano ◽  
S. R. Teixeira ◽  
L. Amaral

1990 ◽  
Vol 187 ◽  
Author(s):  
B. Blanpain ◽  
J.W. Mayer

AbstractWe show that the decagonal Al3Pd phase can be formed by solid state reaction in lateral and conventional thin film couples of Al and Pd. The metastable decagonal phase forms after the initial growth of the Al3Pd2 compound.


1988 ◽  
Vol 3 (3) ◽  
pp. 461-465 ◽  
Author(s):  
H. Schröder ◽  
K. Samwer

Thin-film reactions of Co with Zr have been studied in the temperature range between 473 and 523 K by electrical conductance measurements and cross-sectional transmission electron microscopy (CS-TEM). The reduction of the electrical conductance during the solid state reaction is explained by formation and growth of an amorphous phase at every Zr/Co interface. For long reaction times the growth of the layer thickness follows a shifted $\sqrt t$ law. For short reaction times the measurements show a linear time law, which is expected for an interface limited reaction.


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