Paper II: Simulation of flow conditions in low-pressure flow reactors (Knudsen cells) using a Monte Carlo technique

1997 ◽  
Vol 68 (8) ◽  
pp. 3180-3186 ◽  
Author(s):  
Frederick F. Fenter ◽  
François Caloz ◽  
Michel J. Rossi
1994 ◽  
Vol 72 (3) ◽  
pp. 790-794 ◽  
Author(s):  
M. Maneshkarimi ◽  
H. Heydtmann

Infrared chemiluminescence from the product molecule HF (DF) was observed for the F + CH4(CD4) and F + CHCl3 reactions under low-pressure flow conditions. The reactions with methane and deuterated methane showed the well-known vibrational inversion effect. For the mixed reaction situation F + CH4(CD4) + CHCl3 it can be shown by switching between CH4 and CD4 that no special relaxation effects are present. The HF (DF) spectra can be explained by results from the isolated reactions. A non-inverted distribution was confirmed for F + CHCl3.


2019 ◽  
Vol 20 (12) ◽  
pp. 1151-1157 ◽  
Author(s):  
Alla P. Toropova ◽  
Andrey A. Toropov

Prediction of physicochemical and biochemical behavior of peptides is an important and attractive task of the modern natural sciences, since these substances have a key role in life processes. The Monte Carlo technique is a possible way to solve the above task. The Monte Carlo method is a tool with different applications relative to the study of peptides: (i) analysis of the 3D configurations (conformers); (ii) establishment of quantitative structure – property / activity relationships (QSPRs/QSARs); and (iii) development of databases on the biopolymers. Current ideas related to application of the Monte Carlo technique for studying peptides and biopolymers have been discussed in this review.


1998 ◽  
Vol 120 (2) ◽  
pp. 296-302 ◽  
Author(s):  
Masato Ikegawa ◽  
Jun’ichi Kobayashi ◽  
Morihisa Maruko

As integrated circuits are advancing toward smaller device features, step-coverage in submicron trenches and holes in thin film deposition are becoming of concern. Deposition consists of gas flow in the vapor phase and film growth in the solid phase. A deposition profile simulator using the direct simulation Monte Carlo method has been developed to investigate deposition profile characteristics on small trenches which have nearly the same dimension as the mean free path of molecules. This simulator can be applied to several deposition processes such as sputter deposition, and atmospheric- or low-pressure chemical vapor deposition. In the case of low-pressure processes such as sputter deposition, upstream boundary conditions of the trenches can be calculated by means of rarefied gas flow analysis in the reactor. The effects of upstream boundary conditions, molecular collisions, sticking coefficients, and surface migration on deposition profiles in the trenches were clarified.


1991 ◽  
Vol 258 (1-3) ◽  
pp. A604
Author(s):  
N. Herlin ◽  
M. Pealat ◽  
M. Lefebvre ◽  
P. Alnot ◽  
J. Perrin

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