Ar dilution effects on the elastic properties of hydrogenated amorphous hard-carbon films grown by plasma-enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1330762 ◽

2001 ◽

Vol 89 (2) ◽

pp. 1003-1007 ◽

Author(s):

L. Valentini ◽

J. M. Kenny ◽

G. Carlotti ◽

G. Socino ◽

L. Lozzi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Elastic Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Hard Carbon ◽

Dilution Effects ◽

Hydrogenated Amorphous

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Ar-dilution effects on the elastic and structural properties of hydrogenated hard carbon films deposited by plasma-enhanced chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00391-5 ◽

2001 ◽

Vol 10 (3-7) ◽

pp. 1088-1092 ◽

Author(s):

L Valentini ◽

J.M Kenny ◽

G Mariotto ◽

P Tosi ◽

G Carlotti ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Hard Carbon ◽

Dilution Effects

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The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2996273 ◽

2008 ◽

Vol 93 (13) ◽

pp. 131920 ◽

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Structural, bonding and physical characteristics of phosphorus-doped hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2004.11.138 ◽

2005 ◽

Vol 482 (1-2) ◽

pp. 280-286 ◽

Author(s):

Mohamad Rusop ◽

Tetsuo Soga ◽

Takashi Jimbo

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Physical Characteristics ◽

Amorphous Carbon Films ◽

Structural Bonding ◽

Phosphorus Doped ◽

Hydrogenated Amorphous

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Effect of hydrogen flow on the properties of hydrogenated amorphous carbon films fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2011.03.107 ◽

2011 ◽

Vol 206 (5) ◽

pp. 1007-1010 ◽

Author(s):

X.R. Deng ◽

Y.X. Leng ◽

X. Dong ◽

H. Sun ◽

Nan Huang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogen Flow ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Room temperature deposition of hydrogenated amorphous carbon films from laser-assisted photolytic chemical vapor deposition at 248 nm

Thin Solid Films ◽

10.1016/s0040-6090(01)01193-2 ◽

2001 ◽

Vol 394 (1-2) ◽

pp. 114-123 ◽

Author(s):

M Lindstam

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Room Temperature ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Temperature Deposition ◽

Hydrogenated Amorphous

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Spectroscopic properties of nitrogen doped hydrogenated amorphous carbon films grown by radio frequency plasma-enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1371268 ◽

2001 ◽

Vol 89 (12) ◽

pp. 7924-7931 ◽

Author(s):

Y. Hayashi ◽

G. Yu ◽

M. M. Rahman ◽

K. M. Krishna ◽

T. Soga ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Spectroscopic Properties ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Amorphous Carbon Films ◽

Nitrogen Doped ◽

Frequency Plasma ◽

Hydrogenated Amorphous

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Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2008.06.136 ◽

2008 ◽

Vol 255 (5) ◽

pp. 1836-1840 ◽

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Stress Relief ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Effect of deposition pressure on bonding nature in hydrogenated amorphous carbon films processed by electron cyclotron resonance plasma enhanced chemical vapor deposition

Materials Science and Engineering A ◽

10.1016/s0921-5093(99)00566-3 ◽

2000 ◽

Vol 277 (1-2) ◽

pp. 57-63 ◽

Author(s):

Ho J. Ryu ◽

Sung H. Kim ◽

Soon H. Hong

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Deposition Pressure ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Effects of flow ratios on surface morphology and structure of hydrogenated amorphous carbon films prepared by microwave plasma chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2009.06.111 ◽

2009 ◽

Vol 255 (22) ◽

pp. 9058-9061 ◽

Author(s):

S.B. Yang ◽

F.M. Pan ◽

Y.E. Yang ◽

W.C. Zhang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Morphology And Structure ◽

Hydrogenated Amorphous

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Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods

Electrochimica Acta ◽

10.1016/j.electacta.2010.11.006 ◽

2011 ◽

Vol 56 (3) ◽

pp. 1172-1181 ◽

Author(s):

Yoriko Tanaka ◽

Masahiro Furuta ◽

Koichi Kuriyama ◽

Ryosuke Kuwabara ◽

Yukiko Katsuki ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrochemical Properties ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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