Spectroscopic properties of nitrogen doped hydrogenated amorphous carbon films grown by radio frequency plasma-enhanced chemical vapor deposition

Vapor Deposition ◽

Chemical Vapor ◽

Spectroscopic Properties ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Amorphous Carbon Films ◽

Nitrogen Doped ◽

Frequency Plasma ◽

Effect of Radio Frequency Power on the Properties of Hydrogenated Amorphous Carbon Films Grown by Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.4088 ◽

2000 ◽

Vol 39 (Part 1, No. 7A) ◽

pp. 4088-4093 ◽

Cited By ~ 22

Author(s):

Yasuhiko Hayashi ◽

Kouji Hagimoto ◽

Hiroshi Ebisu ◽

Murali Krishna Kalaga ◽

Tetsuo Soga ◽

...

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Amorphous Carbon Films ◽

Frequency Plasma ◽

Hydrogenated Amorphous ◽

Frequency Power

Physical and Microstructural Properties of Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition Grown n-Type Phosphorus Doped Amorphous Carbon Films on the Contribution to Carbon-Based Solar Cells

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.6124 ◽

2005 ◽

Vol 44 (8) ◽

pp. 6124-6130 ◽

Cited By ~ 8

Author(s):

Mohamad Rusop ◽

Hiroshi Ebisu ◽

Mitsuhiro Adachi ◽

Tetsuo Soga ◽

Takashi Jimbo

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Microstructural Properties ◽

Amorphous Carbon Films ◽

Frequency Plasma ◽

Phosphorus Doped

Positive and negative direct current bias effects on the microstructures and physical properties of hydrogenated amorphous carbon films prepared by radio frequency plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579398 ◽

1995 ◽

Vol 13 (2) ◽

pp. 195-199 ◽

Cited By ~ 15

Author(s):

Masatoshi Nakayama ◽

Atsuhiro Tsuyoshi ◽

Masanori Shibahara ◽

Kazunori Maruyama ◽

Kiichiro Kamata

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Bias ◽

Frequency Plasma ◽

Fabrication and Characteristics of Amorphous Carbon Films Grown in Pure Methane Plasma by using Radio Frequency Plasma Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.1744 ◽

2003 ◽

Vol 42 (Part 1, No. 4A) ◽

pp. 1744-1748 ◽

Cited By ~ 9

Author(s):

Kyung-Jea Cho ◽

Jeong-Tak Ryu ◽

Yang-Gyu Baek ◽

Takashi Ikuno ◽

Shin-ichi Honda ◽

...

Keyword(s):

Radio Frequency ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Amorphous Carbon Films ◽

Frequency Plasma ◽

Pure Methane

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

Effect of thermodynamic parameters on properties of silicon-carbon films prepared by radio-frequency plasma-enhanced chemical vapor deposition for anti-reflective and photo-luminescent coatings

10.1116/6.0001052 ◽

2021 ◽

Vol 39 (4) ◽

pp. 042203

Author(s):

William W. Hernández-Montero ◽

Adrián Itzmoyotl-Toxqui ◽

Carlos Zúñiga-Islas

Keyword(s):

Thermodynamic Parameters ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Silicon Carbon ◽

Frequency Plasma ◽

Photo Luminescent ◽

Luminescent Coatings

Hydrogenated amorphous carbon films deposited by low‐frequency plasma chemical vapor deposition at room temperature

Journal of Applied Physics ◽

10.1063/1.343846 ◽

1989 ◽

Vol 66 (1) ◽

pp. 447-449 ◽

Cited By ~ 10

Author(s):

M. Shimozuma ◽

G. Tochitani ◽

H. Ohno ◽

H. Tagashira ◽

J. Nakahara

Keyword(s):

Vapor Deposition ◽

Room Temperature ◽

Low Frequency ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma ◽

The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2996273 ◽

2008 ◽

Vol 93 (13) ◽

pp. 131920 ◽

Cited By ~ 15

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Structural, bonding and physical characteristics of phosphorus-doped hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2004.11.138 ◽

2005 ◽

Vol 482 (1-2) ◽

pp. 280-286 ◽

Cited By ~ 12

Author(s):

Mohamad Rusop ◽

Tetsuo Soga ◽

Takashi Jimbo

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Physical Characteristics ◽

Amorphous Carbon Films ◽

Structural Bonding ◽

Phosphorus Doped ◽

Effect of hydrogen flow on the properties of hydrogenated amorphous carbon films fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2011.03.107 ◽

2011 ◽

Vol 206 (5) ◽

pp. 1007-1010 ◽

Cited By ~ 15

Author(s):

X.R. Deng ◽

Y.X. Leng ◽

X. Dong ◽

H. Sun ◽

Nan Huang

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogen Flow ◽

Hydrogenated Amorphous ◽

Resonance Plasma

Room temperature deposition of hydrogenated amorphous carbon films from laser-assisted photolytic chemical vapor deposition at 248 nm

Thin Solid Films ◽

10.1016/s0040-6090(01)01193-2 ◽

2001 ◽

Vol 394 (1-2) ◽

pp. 114-123 ◽

Cited By ~ 8

Author(s):

M Lindstam

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Room Temperature ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Temperature Deposition ◽