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Effect of magnetic field on random telegraph noise in the source current of p-channel metal–oxide–semiconductor field-effect transistors
Applied Physics Letters
◽
10.1063/1.1596381
◽
2003
◽
Vol 83
(4)
◽
pp. 710-712
◽
Cited By ~ 3
Author(s):
Filipp A. Baron
◽
Yaohui Zhang
◽
Mingqiang Bao
◽
Ruigang Li
◽
Jinmin Li
◽
...
Keyword(s):
Magnetic Field
◽
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Random Telegraph Noise
◽
Telegraph Noise
◽
Source Current
Download Full-text
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References
Investigation of Relationship between Interface State and Random Telegraph Noise Using Metal–Oxide–Semiconductor Field-Effect Transistors Fabricated on Si(100), (110), and (111) Substrates
Japanese Journal of Applied Physics
◽
10.7567/jjap.51.114001
◽
2012
◽
Vol 51
(11R)
◽
pp. 114001
◽
Cited By ~ 1
Author(s):
Naoki Tega
◽
Hiroshi Miki
◽
Toshiyuki Mine
◽
Kazuyoshi Torii
Keyword(s):
Metal Oxide
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Field Effect
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Field Effect Transistors
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Interface State
◽
Metal Oxide Semiconductor
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Oxide Semiconductor
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Random Telegraph Noise
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Investigation of Relationship between Interface State and Random Telegraph Noise Using Metal–Oxide–Semiconductor Field-Effect Transistors Fabricated on Si(100), (110), and (111) Substrates
Japanese Journal of Applied Physics
◽
10.1143/jjap.51.114001
◽
2012
◽
Vol 51
◽
pp. 114001
Author(s):
Naoki Tega
◽
Hiroshi Miki
◽
Toshiyuki Mine
◽
Kazuyoshi Torii
Keyword(s):
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Interface State
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Random Telegraph Noise
◽
Telegraph Noise
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Extraction of time constants ratio over nine orders of magnitude for understanding random telegraph noise in metal–oxide–semiconductor field-effect transistors
Japanese Journal of Applied Physics
◽
10.7567/jjap.53.04ec19
◽
2014
◽
Vol 53
(4S)
◽
pp. 04EC19
◽
Cited By ~ 10
Author(s):
Toshiki Obara
◽
Akihiro Yonezawa
◽
Akinobu Teramoto
◽
Rihito Kuroda
◽
Shigetoshi Sugawa
◽
...
Keyword(s):
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Random Telegraph Noise
◽
Time Constants
◽
Telegraph Noise
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Effects of plasma-induced charging damage on random telegraph noise in metal–oxide–semiconductor field-effect transistors with SiO2and high-kgate dielectrics
Japanese Journal of Applied Physics
◽
10.7567/jjap.53.03df02
◽
2014
◽
Vol 53
(3S2)
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pp. 03DF02
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Cited By ~ 2
Author(s):
Masayuki Kamei
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◽
Kouichi Ono
Keyword(s):
Metal Oxide
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Field Effect
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Field Effect Transistors
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Metal Oxide Semiconductor
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Oxide Semiconductor
◽
Random Telegraph Noise
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Telegraph Noise
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An automated system for measurement of random telegraph noise in metal-oxide-semiconductor field-effect transistors
IEEE Transactions on Electron Devices
◽
10.1109/16.24373
◽
1989
◽
Vol 36
(6)
◽
pp. 1217-1219
◽
Cited By ~ 19
Author(s):
K.K. Hung
◽
P.K. Ko
◽
C. Hu
◽
Y.C. Cheng
Keyword(s):
Metal Oxide
◽
Field Effect
◽
Field Effect Transistors
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Automated System
◽
Random Telegraph Noise
◽
Telegraph Noise
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Characterization of Oxide Traps in 28 nm n-Type Metal–Oxide–Semiconductor Field-Effect Transistors with Different Uniaxial Tensile Stresses Utilizing Random Telegraph Noise
Japanese Journal of Applied Physics
◽
10.7567/jjap.52.04cc24
◽
2013
◽
Vol 52
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◽
pp. 04CC24
◽
Cited By ~ 2
Author(s):
Bo-Chin Wang
◽
San-Lein Wu
◽
Yu-Ying Lu
◽
Chien-Wei Huang
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Chung-Yi Wu
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...
Keyword(s):
Metal Oxide
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Field Effect
◽
Field Effect Transistors
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Metal Oxide Semiconductor
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Oxide Semiconductor
◽
Uniaxial Tensile
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Random Telegraph Noise
◽
Tensile Stresses
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Telegraph Noise
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Characterization of Oxide Tarps in 28 nm p-Type Metal–Oxide–Semiconductor Field-Effect Transistors with Tip-Shaped SiGe Source/Drain Based on Random Telegraph Noise
Japanese Journal of Applied Physics
◽
10.7567/jjap.51.02bc11
◽
2012
◽
Vol 51
(2S)
◽
pp. 02BC11
◽
Cited By ~ 2
Author(s):
Bo Chin Wang
◽
San Lein Wu
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Chien Wei Huang
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Yu Ying Lu
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Shoou Jinn Chang
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...
Keyword(s):
Metal Oxide
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Field Effect
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Field Effect Transistors
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Metal Oxide Semiconductor
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Oxide Semiconductor
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Random Telegraph Noise
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Telegraph Noise
◽
P Type
◽
28 Nm
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Characterization of random telegraph noise in gate induced drain leakage current of n- and p-type metal-oxide-semiconductor field-effect transistors
Applied Physics Letters
◽
10.1063/1.3292204
◽
2010
◽
Vol 96
(4)
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pp. 043502
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Cited By ~ 9
Author(s):
Ju-Wan Lee
◽
Hyungcheol Shin
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Jong-Ho Lee
Keyword(s):
Metal Oxide
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Leakage Current
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Field Effect
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Field Effect Transistors
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Metal Oxide Semiconductor
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Oxide Semiconductor
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Random Telegraph Noise
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Telegraph Noise
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Characterization of Oxide Tarps in 28 nm p-Type Metal–Oxide–Semiconductor Field-Effect Transistors with Tip-Shaped SiGe Source/Drain Based on Random Telegraph Noise
Japanese Journal of Applied Physics
◽
10.1143/jjap.51.02bc11
◽
2012
◽
Vol 51
(2)
◽
pp. 02BC11
◽
Cited By ~ 1
Author(s):
Bo Chin Wang
◽
San Lein Wu
◽
Chien Wei Huang
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Yu Ying Lu
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Shoou Jinn Chang
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...
Keyword(s):
Metal Oxide
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Field Effect
◽
Field Effect Transistors
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Metal Oxide Semiconductor
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Oxide Semiconductor
◽
Random Telegraph Noise
◽
Telegraph Noise
◽
P Type
◽
28 Nm
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Triggering voltage for post-breakdown random telegraph noise in HfLaO dielectric metal gate metal-oxide-semiconductor field effect transistors and its reliability implications
Journal of Applied Physics
◽
10.1063/1.3676255
◽
2012
◽
Vol 111
(2)
◽
pp. 024101
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Cited By ~ 1
Author(s):
W. H. Liu
◽
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Metal Oxide
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Field Effect
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Field Effect Transistors
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Metal Oxide Semiconductor
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Oxide Semiconductor
◽
Metal Gate
◽
Random Telegraph Noise
◽
Telegraph Noise
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