Electron Transport on Hydrogen-Passivated Silicon Surfaces

2005 ◽  
Author(s):  
K. Eng
2006 ◽  
Vol 326 (1) ◽  
pp. 144-150 ◽  
Author(s):  
R. Basu ◽  
C.R. Kinser ◽  
J.D. Tovar ◽  
M.C. Hersam

2007 ◽  
Vol 91 (7) ◽  
pp. 073110 ◽  
Author(s):  
L. S. C. Pingree ◽  
M. J. Schmitz ◽  
D. E. Kramer ◽  
M. C. Hersam

2016 ◽  
Vol 28 (11) ◽  
pp. 3634-3640 ◽  
Author(s):  
Thibault Alphazan ◽  
Laurent Mathey ◽  
Martin Schwarzwälder ◽  
Tsung-Han Lin ◽  
Aaron J. Rossini ◽  
...  

2011 ◽  
Vol 109 (6) ◽  
pp. 064505 ◽  
Author(s):  
Johannes Seiffe ◽  
Marc Hofmann ◽  
Jochen Rentsch ◽  
Ralf Preu

2011 ◽  
Vol 605 (13-14) ◽  
pp. 1308-1312 ◽  
Author(s):  
Sushobhan Avasthi ◽  
Yabing Qi ◽  
Grigory K. Vertelov ◽  
Jeffrey Schwartz ◽  
Antoine Kahn ◽  
...  

1980 ◽  
Vol 98 (1-3) ◽  
pp. 407-412 ◽  
Author(s):  
G. Dorda ◽  
H. Gesch ◽  
I. Eisele

2003 ◽  
Vol 528 (1-3) ◽  
pp. 91-96 ◽  
Author(s):  
Yasushi Yamauchi ◽  
Xin Ju ◽  
Taku Suzuki ◽  
Mitsunori Kurahashi

1993 ◽  
Vol 318 ◽  
Author(s):  
Xiaochuan Zhou ◽  
Wiley P. Kirk

ABSTRACTThe crystalline quality of ZnS films grown on arsenic covered Si(100) surfaces is shown to be improved as compared to films grown on bare silicon surfaces by MBE (molecular beam epitaxy). Employing RGA (residual gas analyzer) and RHEED (reflection high energy electron diffraction) techniques, we found that a strong initial adsorption of sulfur on bare silicon surfaces led to the formation of disordered silicon-sulfide surfaces. This disordered surface initiated three-dimensional growth of ZnS and resulted in poor crystalline quality. An arsenic overlayer was found to be effective in preventing the interaction of sulfur with the silicon surface and thereby maintained surface ordering. X-ray rocking curve analysis indicated higher crystallinity in ZnS films grown on arsenic covered surfaces.


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