Effects of substrate bias on the preferred orientation, phase transition and mechanical properties for NbN films grown by direct current reactive magnetron sputtering

2008 ◽  
Vol 104 (2) ◽  
pp. 023527 ◽  
Author(s):  
M. Wen ◽  
C. Q. Hu ◽  
C. Wang ◽  
T. An ◽  
Y. D. Su ◽  
...  
2015 ◽  
Vol 816 ◽  
pp. 283-288 ◽  
Author(s):  
Hao Huang ◽  
Zhen Xi Li ◽  
Min Juan Wang ◽  
Chuan Xie

Two series of TiAlN and Ti3AlN films have been deposited on Si (100) substrates by reactive magnetron sputtering TiAl and Ti3Al targets in Ar/N2 mixture. The effects of incoming ions energies controlled by Vb on the microstructure, morphologies, residual stress and hardness have been explored by XRD, SEM, AFM, surface profiler and nanoindentation. The results showed that single phase cubic Ti-Al-N solid solubility formed by Al atoms replacing some Ti atoms in the cubic TiN lattice occured in both TiAlN and Ti3AlN films. As substrate bias increased, the preferred orientation firstly changed from (111) to (200), and then returned to (111) at higher substrate bias. At the same time, high substrate bias promoted the densification of films and presence of high compressive stress, which is benefit for improvement of hardness.


2021 ◽  
pp. 149879
Author(s):  
K.P. Valdez ◽  
H.A. Castillo ◽  
Leonel Cota ◽  
J.H. Quintero-Orozco ◽  
E. Restrepo-Parra ◽  
...  

2011 ◽  
Vol 205 (19) ◽  
pp. 4471-4479 ◽  
Author(s):  
Andrzej Czyżniewski ◽  
Witold Gulbiński ◽  
György Radnóczi ◽  
Marianna Szerencsi ◽  
Mieczysław Pancielejko

2015 ◽  
Vol 18 (suppl 2) ◽  
pp. 30-34 ◽  
Author(s):  
Flávio Gustavo Ribeiro Freitas ◽  
Roberto Hübler ◽  
Gabriel Soares ◽  
Amanda Gardênia Santos Conceição ◽  
Edson Reis Vitória ◽  
...  

Author(s):  
Mohamed El Garah ◽  
Djallel Eddine Touaibia ◽  
Sofiane Achache ◽  
Alexandre Michau ◽  
Elizaveta Sviridova ◽  
...  

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