The effects of substrate bias, substrate temperature, and pulse frequency on the microstructures of chromium nitride coatings deposited by pulsed direct current reactive magnetron sputtering

2005 ◽  
Vol 34 (12) ◽  
pp. 1484-1492 ◽  
Author(s):  
Jyh-Wei Lee ◽  
Shih-Kang Tien ◽  
Yu-Chu Kuo
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Direct Current ◽  
Pulse Frequency ◽  
Reactive Magnetron Sputtering ◽  
Chromium Nitride ◽  
Substrate Bias ◽  
Reactive Magnetron ◽  
Nitride Coatings ◽  
Pulsed Direct Current

scholarly journals Epitaxial Growth of CaMnO 3– y Films on LaAlO 3 (112¯0) by Pulsed Direct Current Reactive Magnetron Sputtering

2022 ◽  
pp. 2100504
Author(s):  
Erik Ekström ◽  
Anna Elsukova ◽  
Justine Grasland ◽  
Justinas Palisaitis ◽  
Ganpati Ramanath ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Epitaxial Growth ◽  
Direct Current ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Pulsed Direct Current

Effect of Duty Cycle on Characteristics of CrNxThin Films Deposited by Pulsed Direct Current Reactive Magnetron Sputtering

2013 ◽  
Vol 52 (11S) ◽  
pp. 11NB08 ◽  
Author(s):  
Chi-Lung Chang ◽  
Bo-Yi Wu ◽  
Pin-Hung Chen ◽  
Wei-Chih Chen ◽  
Chun-Ta Ho ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Direct Current ◽  
Duty Cycle ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Pulsed Direct Current

Performance improvement of TiO2/CuO by increasing oxygen flow rates and substrate temperature using DC reactive magnetron sputtering method

Optik ◽  
2020 ◽  
Vol 206 ◽  
pp. 164297
Author(s):  
Paulina Sawicka-Chudy ◽  
Grzegorz Wisz ◽  
Maciej Sibiński ◽  
Zbigniew Starowicz ◽  
Łukasz Głowa ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Performance Improvement ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Reactive Magnetron ◽  
Flow Rates ◽  
Dc Reactive Magnetron Sputtering
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