X-ray diffraction study of polycrystalline BiFeO3 thin films under electric field

2008 ◽  
Vol 93 (4) ◽  
pp. 042907 ◽  
Author(s):  
Seiji Nakashima ◽  
Osami Sakata ◽  
Yoshitaka Nakamura ◽  
Takeshi Kanashima ◽  
Hiroshi Funakubo ◽  
...  
2011 ◽  
Vol 59 (3(1)) ◽  
pp. 2556-2559 ◽  
Author(s):  
Seiji Nakashima ◽  
Osami Sakata ◽  
Hironori Fujisawa ◽  
Jung Min Park ◽  
Takeshi Kanashima ◽  
...  

2017 ◽  
Vol 111 (8) ◽  
pp. 082907 ◽  
Author(s):  
Seiji Nakashima ◽  
Osami Sakata ◽  
Hiroshi Funakubo ◽  
Takao Shimizu ◽  
Daichi Ichinose ◽  
...  

1995 ◽  
Vol 34 (Part 1, No. 11) ◽  
pp. 6036-6040
Author(s):  
A. Z. Moshfegh ◽  
A. H. Fatollahi ◽  
Y. Q. Wang ◽  
Y. Y. Sun ◽  
P. H. Hor ◽  
...  

2015 ◽  
Vol 3 (43) ◽  
pp. 11357-11365 ◽  
Author(s):  
Geert Rampelberg ◽  
Bob De Schutter ◽  
Wouter Devulder ◽  
Koen Martens ◽  
Iuliana Radu ◽  
...  

VO2 and V2O3 thin films were prepared during in situ XRD investigation by oxidation and reduction of V and V2O5. Films show up to 5 orders of magnitude resistance switching.


2005 ◽  
Vol 244 (1-4) ◽  
pp. 281-284 ◽  
Author(s):  
Naohiko Kato ◽  
Ichiro Konomi ◽  
Yoshiki Seno ◽  
Tomoyoshi Motohiro

2013 ◽  
Vol 103 (24) ◽  
pp. 242904 ◽  
Author(s):  
J. Sinsheimer ◽  
S. J. Callori ◽  
B. Ziegler ◽  
B. Bein ◽  
P. V. Chinta ◽  
...  

2002 ◽  
Vol 54 (2-3) ◽  
pp. 169-174 ◽  
Author(s):  
N Nancheva ◽  
P Docheva ◽  
N Djourelov ◽  
M Balcheva

1976 ◽  
Vol 47 (7) ◽  
pp. 2857-2861 ◽  
Author(s):  
M. Murakami ◽  
D. deFontaine

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