Room Temperature Growth Of Nano-crystalline InN Films On Flexible Substrates By Modified Activated Reactive Evaporation

Mapping Intimacies ◽

10.1063/1.3183473 ◽

2009 ◽

Author(s):

S. R. Meher ◽

Kuyyadi P. Biju ◽

Mahaveer K. Jain ◽

M. R. Singh ◽

R. H. Lipson

Keyword(s):

Room Temperature ◽

Flexible Substrates ◽

Temperature Growth ◽

Reactive Evaporation ◽

Nano Crystalline ◽

Activated Reactive Evaporation

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Room temperature growth of high crystalline quality Cu3N thin films by modified activated reactive evaporation

Materials Science and Engineering B ◽

10.1016/j.mseb.2014.10.002 ◽

2015 ◽

Vol 191 ◽

pp. 7-14 ◽

Author(s):

Guruprasad Sahoo ◽

S.R. Meher ◽

Mahaveer K. Jain

Keyword(s):

Room Temperature ◽

Crystalline Quality ◽

High Crystalline Quality ◽

Temperature Growth ◽

Reactive Evaporation ◽

Activated Reactive Evaporation

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Room temperature growth of InxGa1−xN thin films by mixed source modified activated reactive evaporation

Applied Surface Science ◽

10.1016/j.apsusc.2011.05.035 ◽

2011 ◽

Vol 257 (20) ◽

pp. 8623-8628 ◽

Author(s):

S.R. Meher ◽

Kuyyadi P. Biju ◽

Mahaveer K. Jain

Keyword(s):

Room Temperature ◽

Temperature Growth ◽

Reactive Evaporation ◽

Activated Reactive Evaporation

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Synthesis of ZnO Nanoneedles on Flexible Polymer Substrates at Room Temperature by Activated Reactive Evaporation

Current Nanoscience ◽

10.2174/157341309788921444 ◽

2009 ◽

Vol 5 (3) ◽

pp. 283-288 ◽

Author(s):

D. Yuvaraj ◽

K. Nanda ◽

K. Rao

Keyword(s):

Room Temperature ◽

Polymer Substrates ◽

Reactive Evaporation ◽

Flexible Polymer ◽

Activated Reactive Evaporation

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Tailoring of electrochemical properties of V2O5 thin films grown on flexible substrates using plasma-assisted activated reactive evaporation

Ionics ◽

10.1007/s11581-013-0862-9 ◽

2013 ◽

Vol 19 (10) ◽

pp. 1359-1365 ◽

Author(s):

K. Hari Krishna ◽

O. M. Hussain

Keyword(s):

Electrochemical Properties ◽

Flexible Substrates ◽

Reactive Evaporation ◽

V2o5 Thin Films ◽

Activated Reactive Evaporation

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Optical, Field-Emission, and Antimicrobial Properties of ZnO Nanostructured Films Deposited at Room Temperature by Activated Reactive Evaporation

ACS Applied Materials & Interfaces ◽

10.1021/am900792k ◽

2010 ◽

Vol 2 (4) ◽

pp. 1019-1024 ◽

Author(s):

D. Yuvaraj ◽

R. Kaushik ◽

K. Narasimha Rao

Keyword(s):

Field Emission ◽

Room Temperature ◽

Antimicrobial Properties ◽

Optical Field ◽

Nanostructured Films ◽

Reactive Evaporation ◽

Activated Reactive Evaporation

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Deposition of ZnO nanostructured film at room temperature on glass substrates by activated reactive evaporation

Applied Nanoscience ◽

10.1007/s13204-013-0258-1 ◽

2013 ◽

Vol 4 (7) ◽

pp. 801-808 ◽

Author(s):

D. Yuvaraj ◽

M. Sathyanarayanan ◽

K. Narasimha Rao

Keyword(s):

Room Temperature ◽

Nanostructured Film ◽

Glass Substrates ◽

Reactive Evaporation ◽

Activated Reactive Evaporation

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Room temperature synthesis of ZnO nanoneedles by activated reactive evaporation

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/42/3/035403 ◽

2008 ◽

Vol 42 (3) ◽

pp. 035403 ◽

Author(s):

D Yuvaraj ◽

K Narasimha Rao ◽

K K Nanda

Keyword(s):

Room Temperature ◽

Temperature Synthesis ◽

Room Temperature Synthesis ◽

Reactive Evaporation ◽

Activated Reactive Evaporation

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Low-temperature growth of polycrystalline GaN films using modified activated reactive evaporation

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2009.01.127 ◽

2009 ◽

Vol 311 (8) ◽

pp. 2275-2280 ◽

Author(s):

Kuyyadi P. Biju ◽

A. Subrahmanyam ◽

Mahaveer K. Jain

Keyword(s):

Low Temperature ◽

Temperature Growth ◽

Low Temperature Growth ◽

Reactive Evaporation ◽

Activated Reactive Evaporation

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High rate deposition of hafnium nitride by activated reactive evaporation (ARE)

Thin Solid Films ◽

10.1016/0040-6090(79)90036-1 ◽

1979 ◽

Vol 63 (2) ◽

pp. 327-331 ◽

Author(s):

R. Nimmagadda ◽

R.F. Bunshah

Keyword(s):

High Rate ◽

Hafnium Nitride ◽

Reactive Evaporation ◽

Activated Reactive Evaporation

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Room temperature growth of biaxially aligned yttria-stabilized zirconia films on glass substrates by pulsed-laser deposition

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/36/13/327 ◽

2003 ◽

Vol 36 (13) ◽

pp. 1605-1608 ◽

Author(s):

Peng Li ◽

Jason Carroll ◽

Jyoti Mazumder

Keyword(s):

Pulsed Laser Deposition ◽

Room Temperature ◽

Pulsed Laser ◽

Yttria Stabilized Zirconia ◽

Laser Deposition ◽

Stabilized Zirconia ◽

Temperature Growth ◽

Glass Substrates ◽

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