Dipolar magnetic surface anisotropy in ferromagnetic thin films with interfacial roughness

1988 ◽  
Vol 64 (6) ◽  
pp. 3153-3156 ◽  
Author(s):  
Patrick Bruno
Keyword(s):  
Thin Films ◽  
Magnetic Surface ◽  
Surface Anisotropy ◽  
Interfacial Roughness ◽  
Ferromagnetic Thin Films

Anisotropy Enhancement in Co Granular Multilayers by Capping

2008 ◽  
Vol 570 ◽  
pp. 1-9 ◽  
Author(s):  
Juan Bartolomé ◽  
F. Luis ◽  
L.M. García ◽  
F. Bartolomé ◽  
F. Petroff ◽  
...  
Keyword(s):  
Thin Films ◽  
Circular Dichroism ◽  
Magnetic Circular Dichroism ◽  
Magnetic Surface ◽  
Surface Anisotropy ◽  
Dominant Contribution ◽  
Effective Anisotropy ◽  
X Ray ◽  
Co Nanoparticles ◽  
Circular Dichroïsm

The effect of capping with Cu, Au and Pt of an array of Co nanoparticles is revised. The magnetic surface anisotropy KS was found to be the dominant contribution to the effective anisotropy Keff of the particles. Recent X-ray Magnetic Circular Dichroism (XMCD) measurements show that there is hybridization between the 3d Co electrons and the d and 4p electrons of the capping metal. By comparison to the mechanisms which give rise to the surface anisotropy in thin films, it is argued that this hybridization governs the modification of KS, and hence, of Keff.

Photoinduced magnetic surface anisotropy field in YIG thin films

1976 ◽  
Author(s):  
T. S. Stakelon ◽  
P. Yen ◽  
H. Puszkarski ◽  
P. E. Wigen
Keyword(s):  
Thin Films ◽  
Anisotropy Field ◽  
Magnetic Surface ◽  
Surface Anisotropy

RANDOM SURFACE ANISOTROPY AND THE MAGNETIZATION OF EPITAXIALLY GROWN THIN FILMS

1988 ◽  
Vol 49 (C8) ◽  
pp. C8-1695-C8-1696 ◽  
Author(s):  
J. R. Cullen ◽  
K. B. Hathaway
Keyword(s):  
Thin Films ◽  
Surface Anisotropy ◽  
Random Surface

Wall Streaming in Ferromagnetic Thin Films

1967 ◽  
Vol 38 (11) ◽  
pp. 4401-4408 ◽  
Author(s):  
K. U. Stein ◽  
E. Feldtkeller
Keyword(s):  
Thin Films ◽  
Ferromagnetic Thin Films

Characterization of the order-annealing response of nanostructured iron-palladium based ferromagnetic thin-films

2001 ◽  
Vol 703 ◽  
Author(s):  
Huiping Xu ◽  
Adam T. Wise ◽  
Timothy J. Klemmer ◽  
Jörg M. K. Wiezorek
Keyword(s):  
Thin Films ◽  
Grain Growth ◽  
Room Temperature ◽  
Si Substrate ◽  
Ferromagnetic Thin Films ◽  
Precipitation Reactions ◽  
Post Deposition ◽  
Xrd And Tem ◽  
Iron Palladium

ABSTRACTA combination of XRD and TEM techniques have been used to characterize the response of room temperature magnetron sputtered Fe-Pd thin films on Si-susbtrates to post-deposition order-annealing at temperatures between 400-500°C. Deposition produced the disordered Fe-Pd phase with (111)-twinned grains approximately 18nm in size. Ordering occurred for annealing at 450°C and 500°C after 1.8ks, accompanied by grain growth (40-70nm). The ordered FePd grains contained (111)-twins rather than {101}-twins typical of bulk ordered FePd. The metallic overlayers and underlayers selected here produced detrimental dissolution (Pt into Fe-Pd phases) and precipitation reactions between Pd and the Si substrate.

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