Commissioning of a Soft X-ray Beamline PF-BL-16A with a Variable-Included-Angle Varied-Line-Spacing Grating Monochromator

2010 ◽  
Author(s):  
Kenta Amemiya ◽  
Akio Toyoshima ◽  
Takashi Kikuchi ◽  
Takashi Kosuge ◽  
Kazuyuki Nigorikawa ◽  
...  
Keyword(s):  
Included Angle ◽  
X Ray ◽  
Line Spacing ◽  
Grating Monochromator

Applications of VUV extra-focus mechanism: high-performance dual-mode monochromator from VUV to soft X-ray

2015 ◽  
Vol 22 (6) ◽  
pp. 1353-1358 ◽  
Author(s):  
Chaofan Xue ◽  
Yanqing Wu ◽  
Ying Zou ◽  
Lian Xue ◽  
Zhi Guo ◽  
...  
Keyword(s):  
High Performance ◽  
Vacuum Ultraviolet ◽  
Normal Incidence ◽  
Resolving Power ◽  
Dual Mode ◽  
Included Angle ◽  
X Ray ◽  
Line Spacing ◽  
Grating Monochromator ◽  
Mode Solution

A new monochromator scheme is presented in which an extra-focus constant-included-angle varied-line-spacing cylindrical-grating monochromator (extra-focus CIA-VCGM) is conveniently combined with a variable-included-angle varied-line-spacing plane-grating monochromator (VIA-VPGM). This dual-mode solution delivers high performance in the energy range from vacuum ultraviolet (VUV) to soft X-ray. The resolving power and the efficiency of this dual-mode grating monochromator are analyzed in detail based on realistic parameters. Comparisons with the commonly used variable-included-angle plane-grating monochromator and normal-incidence monochromator (VIA-PGM/NIM) hybrid monochromator are made.

A new extra-focus monochromator designed for high-performance VUV beamlines

2015 ◽  
Vol 22 (2) ◽  
pp. 328-335 ◽  
Author(s):  
Chaofan Xue ◽  
Yanqing Wu ◽  
Ying Zou ◽  
Lian Xue ◽  
Yong Wang ◽  
...  
Keyword(s):  
High Performance ◽  
Vacuum Ultraviolet ◽  
Wide Energy Range ◽  
X Ray ◽  
Ultraviolet Range ◽  
Line Spacing ◽  
Wide Energy ◽  
Focus Spot ◽  
Grating Monochromator ◽  
Mechanical Compatibility

A new monochromator called an extra-focus constant-included-angle varied-line-spacing (VLS) cylindrical-grating monochromator (extra-focus CIA-VCGM) is described. This monochromator is based on the Hettrick–Underwood scheme where the plane VLS grating is replaced by a cylindrical one in order to zero the defocus at three reference photon energies in the vacuum-ultraviolet range. It has a simple mechanical structure and a fixed focus spot with high performance over a wide energy range. Furthermore, its mechanical compatibility with a standard VLS plane-grating monochromator allows convenient extension into the soft-X-ray range.

Application of a Varied-Line-Spacing Grating in a High-Performance Soft X-ray Monochromator

1998 ◽  
Vol 5 (3) ◽  
pp. 246-251 ◽  
Author(s):  
Yonglian Yan ◽  
Eiji Shigemasa ◽  
Akira Yagishita
Keyword(s):  
High Resolution ◽  
Experimental Evaluation ◽  
High Performance ◽  
X Ray ◽  
Photon Factory ◽  
Line Spacing ◽  
Grating Monochromator

The design and experimental evaluation of a high-resolution varied-line-spacing-grating monochromator constructed at the Photon Factory are described. Various applications of a varied-line-spacing grating in a high-performance soft X-ray monochromator are discussed.

RECENT DEVELOPMENT IN SOFT X-RAY SPECTROSCOPY OF CORRELATED MATERIALS: HIGH RESOLUTION ABSORPTION AND BULK-SENSITIVE PHOTOEMISSION

2002 ◽  
Vol 09 (02) ◽  
pp. 1221-1228 ◽  
Author(s):  
SHIGEMASA SUGA
Keyword(s):  
Photoelectron Spectroscopy ◽  
Light Sources ◽  
Electron Systems ◽  
Correlated Electron Systems ◽  
X Ray ◽  
Angle Resolved Photoemission Spectroscopy ◽  
Correlated Electron ◽  
Line Spacing ◽  
Fundamental Radiation ◽  
Grating Monochromator

An extremely high quality soft X-ray beam line was constructed at BL25SU of SPring-8. A varied line spacing plane grating monochromator (VLSPGM) equipped with gratings with the central groove density of 600 and 1,000/mm can cover the energy region from 0.22 to 2 keV by the use of the fundamental radiation from the twin helical undulator. The energy resolution of VLSPGM is beyond 20,000 at 1 keV. The total resolution of practical photoelectron spectroscopy (PES) of better than 80 meV is achieved at 880 eV. The PES measurements performed above several hundred eV have shown the bulk sensitivity in many materials and provided spectra much different from the surface-sensitive spectra so far obtained below slightly above 100 eV or by He II and I light sources. As a breakthrough, bulk-sensitive angle-resolved photoemission spectroscopy (ARPES) is demonstrated to be a very powerful means of studying the bulk electronic states of correlated electron systems.

A variable fixed-focus constant optimization method for a variable-included-angle varied-line-spacing plane-grating monochromator

2019 ◽  
Vol 26 (4) ◽  
pp. 1192-1197 ◽  
Author(s):  
Chaofan Xue ◽  
Lian Xue ◽  
Yanqing Wu ◽  
Yong Wang ◽  
Shumin Yang ◽  
...  
Keyword(s):  
Optimization Method ◽  
The Self ◽  
Resolving Power ◽  
Correction Function ◽  
Aberration Correction ◽  
Included Angle ◽  
Variable Line ◽  
Self Focusing ◽  
Line Spacing ◽  
Grating Monochromator

Variable-included-angle varied-line-spacing plane-grating monochromators (VIA-VPGM) have been applied to many beamlines because of the self-focusing and aberration-correction function of the varied-line-spacing grating. Unfortunately, to optimize the variable-line-spacing coefficient of the grating, the fixed-focus constant (C ff) has to be fixed first in the VIA-VPGM. In this way, some of the advantages of these monochromators are lost, such as the flexibility of choosing a different energy-resolving power by varying the C ff. In this work, a variable C ff optimization method is introduced for a VIA-VPGM. By adopting this method, the C ff could be arbitrarily selected in the VIA-VPGM.

Design of an ultrahigh-energy-resolution and wide-energy-range soft X-ray beamline

2013 ◽  
Vol 21 (1) ◽  
pp. 273-279 ◽  
Author(s):  
L. Xue ◽  
R. Reininger ◽  
Y.-Q. Wu ◽  
Y. Zou ◽  
Z.-M. Xu ◽  
...  
Keyword(s):  
Energy Range ◽  
Energy Resolution ◽  
Wide Energy Range ◽  
Ultrahigh Energy ◽  
Exit Slit ◽  
Shanghai Synchrotron Radiation Facility ◽  
X Ray ◽  
Variable Line ◽  
Line Spacing ◽  
Wide Energy

A new ultrahigh-energy-resolution and wide-energy-range soft X-ray beamline has been designed and is under construction at the Shanghai Synchrotron Radiation Facility. The beamline has two branches: one dedicated to angle-resolved photoemission spectroscopy (ARPES) and the other to photoelectron emission microscopy (PEEM). The two branches share the same plane-grating monochromator, which is equipped with four variable-line-spacing gratings and covers the 20–2000 eV energy range. Two elliptically polarized undulators are employed to provide photons with variable polarization, linear in every inclination and circular. The expected energy resolution is approximately 10 meV at 1000 eV with a flux of more than 3 × 1010 photons s−1at the ARPES sample positions. The refocusing of both branches is based on Kirkpatrick–Baez pairs. The expected spot sizes when using a 10 µm exit slit are 15 µm × 5 µm (horizontal × vertical FWHM) at the ARPES station and 10 µm × 5 µm (horizontal × vertical FWHM) at the PEEM station. The use of plane optical elements upstream of the exit slit, a variable-line-spacing grating and a pre-mirror in the monochromator that allows the influence of the thermal deformation to be eliminated are essential for achieving the ultrahigh-energy resolution.

Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

2016 ◽  
Author(s):  
Dakui Lin ◽  
Huoyao Chen ◽  
Stefanie Kroker ◽  
Thomas Käsebier ◽  
Zhengkun Liu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Near Field ◽  
X Ray ◽  
Line Spacing

scholarly journals Iterative regularity and parent-offspring growth mold of stable grain array in bismuth silicate micro-crystals

2011 ◽  
Vol 43 (1) ◽  
pp. 105-112
Author(s):  
Z.G. Zhang ◽  
X.F. Wang ◽  
Q.Q. Tian
Keyword(s):  
Environmental Scanning Electron Microscopy ◽  
Morphological Properties ◽  
Environmental Scanning ◽  
X Ray Diffraction ◽  
Bismuth Silicate ◽  
X Ray ◽  
Offspring Growth ◽  
Line Spacing ◽  
Array Structure ◽  
Sintering Method

Bismuth silicate micro-crystals with grain array structure were prepared by sintering method under atmosphere pressure. The samples were characterized for structural and surface morphological properties by X-ray diffraction (XRD) and Environmental scanning electron microscopy (ESEM). The result shows that stable grain arrays grow by iterative mode. If a stable grain array eliminates, a new stable grain array will generate. In a stable parent array, an offspring array may generate after the corresponding partial elimination of its parent array. If one part of an offspring array stops growing, it will be as a new parent array, and then its offspring grain array will create. The sum of the lengths of an offspring array and the corresponding eliminated part of its parent array is equal to the length of the next eliminated part of its parent array. It means the growth rate of an offspring array is equal to that of the corresponding survived part of its parent array. There is a highly correlation between grain array length and average grain line spacing. It means that larger average grain line spacing corresponds to the stable grain array with lager length. When average grain line spacing increases 1?m, the corresponding array length will increase approximately 7.6?m.

Effects of plane mirror thermal load on variable included angle plane-grating monochromator resolution

2014 ◽  
Vol 7 (1) ◽  
pp. 105-111
Author(s):  
宋源 SONG Yuan ◽  
卢启鹏 LU Qi-peng ◽  
彭忠琦 PENG Zhong-qi ◽  
龚学鹏 GONG Xue-peng
Keyword(s):  
Thermal Load ◽  
Plane Mirror ◽  
Included Angle ◽  
Grating Monochromator
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