Redistribution and electrical activation of implanted arsenic in silicon on insulator substrates formed by oxygen ion implantation
Keyword(s):
1985 ◽
Vol 43
◽
pp. 300-301
1987 ◽
Vol 134
(8)
◽
pp. 2027-2030
◽
Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):
1983 ◽
Vol 63
(3)
◽
pp. 554-558
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