Local investigation of recombination at grain boundaries in silicon by grain boundary‐electron beam induced current

1993 ◽  
Vol 74 (2) ◽  
pp. 1169-1178 ◽  
Author(s):  
J. Palm
2005 ◽  
Vol 52 (12) ◽  
pp. 1211-1215 ◽  
Author(s):  
J CHEN ◽  
T SEKIGUCHI ◽  
R XIE ◽  
P AHMET ◽  
T CHIKYO ◽  
...  

2009 ◽  
Vol 156-158 ◽  
pp. 561-565
Author(s):  
Takashi Sekiguchi ◽  
Woong Lee ◽  
Jun Chen ◽  
Bin Chen

We have characterized optical property of small-angle (SA) grain-boundaries (GBs) in high-pure multicrystalline Si by using cathodoluminescence (CL). Prior to CL measurement, the electrical activity of GBs were evaluated by using electron-beam-induced current (EBIC). The SA-GBs are categorized into two groups with room temperature (RT-) EBIC contrast. The SA-GBs with misorientation angle about 1º give weak RT-EBIC contrast and yield D3 and D4. The SA-GBs with 2.5º show strong EBIC contrast and yield D1 and D2. These correspondences reflect the dislocation density at the SA-GBs. We also found the curious distribution of D1 emission in some special GBs, which is now difficult to explain. It is noticed that large-angle GBs do not show any D-line emissions at all.


2004 ◽  
Vol 96 (10) ◽  
pp. 5490-5495 ◽  
Author(s):  
J. Chen ◽  
T. Sekiguchi ◽  
D. Yang ◽  
F. Yin ◽  
K. Kido ◽  
...  

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