Effects of high temperature rapid thermal annealing using a flat gas flame on the electrical properties of phosphorus‐doped polycrystalline silicon films
2002 ◽
Vol 389-393
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pp. 795-798
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2013 ◽
Vol 24
(11)
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pp. 4209-4212
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2000 ◽
Vol 39
(Part 2, No. 1A/B)
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pp. L19-L21
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1993 ◽
Vol 8
(3)
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pp. 327-332
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2012 ◽
Vol 23
(7)
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pp. 1279-1283
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2000 ◽
Vol 62
(1-2)
◽
pp. 143-148
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