Effects of high temperature rapid thermal annealing using a flat gas flame on the electrical properties of phosphorus‐doped polycrystalline silicon films

1996 ◽  
Vol 79 (11) ◽  
pp. 8498-8502 ◽  
Author(s):  
W. F. Qu ◽  
Y. Masaki ◽  
A. Kitagawa ◽  
M. Suzuki
2000 ◽  
Vol 39 (Part 2, No. 1A/B) ◽  
pp. L19-L21 ◽  
Author(s):  
Huang-Chung Cheng ◽  
Chun-Yao Huang ◽  
Fang-Shing Wang ◽  
Kuen-Hsien Lin ◽  
Fu-Gow Tarntair

2012 ◽  
Vol 23 (7) ◽  
pp. 1279-1283 ◽  
Author(s):  
Lei Zhang ◽  
Honglie Shen ◽  
Jiayi You ◽  
Feng Jiang ◽  
Tianru Wu ◽  
...  

2000 ◽  
Vol 62 (1-2) ◽  
pp. 143-148 ◽  
Author(s):  
Yuwen Zhao ◽  
Wenjing Wang ◽  
Feng Yun ◽  
Ying Xu ◽  
Xianbo Liao ◽  
...  

1992 ◽  
Vol 71 (1) ◽  
pp. 273-276
Author(s):  
J. Sicart ◽  
P. Jeanjean ◽  
P. Sellitto ◽  
J. L. Robert ◽  
G. Chaussemy ◽  
...  

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