Rapid Thermal Processing for Future Semiconductor Devices
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Published By Elsevier

9780444513397

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Si Epitaxial Growth on the Atomic-Order Nitrided Si(100) Surface in SiH4 Reaction

Rapid Thermal Processing for Future Semiconductor Devices ◽

10.1016/b978-044451339-7/50020-9 ◽

2003 ◽

pp. 139-144

Author(s):

Youngcheon Jeong ◽

Masao Sakuraba ◽

Takashi Matsuura ◽

Junichi Murota

Keyword(s):

Epitaxial Growth ◽

Atomic Order

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Process and Technology Drivers for Single Wafer Processes in DRAM Manufacturing

Rapid Thermal Processing for Future Semiconductor Devices ◽

10.1016/b978-044451339-7/50004-0 ◽

2003 ◽

pp. 17-28 ◽

Cited By ~ 1

Author(s):

R.A. Weimer ◽

D.C. Powell ◽

P.M. Lenahan

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Ultra-high vacuum rapid thermal chemical vapor deposition for formation of TiN as barrier metals

Rapid Thermal Processing for Future Semiconductor Devices ◽

10.1016/b978-044451339-7/50005-2 ◽

2003 ◽

pp. 29-35

Author(s):

S. Naito ◽

M. Okada ◽

O. Nakatsuka ◽

T. Okuhara ◽

A. Sakai ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Vacuum ◽

Chemical Vapor ◽

Ultra High Vacuum ◽

Thermal Chemical Vapor Deposition

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High-Performance Poly-Si TFT and its Application to LCD

Rapid Thermal Processing for Future Semiconductor Devices ◽

10.1016/b978-044451339-7/50007-6 ◽

2003 ◽

pp. 49-58

Author(s):

Hiroki Hamada ◽

Hisashi Abe ◽

Yoshio Miyai

Keyword(s):

High Performance

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Copyright

Rapid Thermal Processing for Future Semiconductor Devices ◽

10.1016/b978-0-444-51339-7.50046-5 ◽

2003 ◽

pp. iv

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Analytical Model for Spike Annealed Diffusion Profiles of Low-Energy and High-Dose Ion Implanted Impurities

Rapid Thermal Processing for Future Semiconductor Devices ◽

10.1016/b978-044451339-7/50003-9 ◽

2003 ◽

pp. 9-16

Author(s):

Kunihiro Suzuki ◽

Hiroko Tashiro

Keyword(s):

Analytical Model ◽

Low Energy ◽

High Dose ◽

Diffusion Profiles ◽

Ion Implanted

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Implementations of Rapid Thermal Processes in Polysilicon TFT Fabrication

Rapid Thermal Processing for Future Semiconductor Devices ◽

10.1016/b978-044451339-7/50006-4 ◽

2003 ◽

pp. 37-47

Author(s):

Miltiadis K. Hatalis ◽

Apostolos T. Voutsas

Keyword(s):

Thermal Processes ◽

Polysilicon Tft

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Large Refractive Index C-S-Au Composite Film Formation by Plasma Processes

Rapid Thermal Processing for Future Semiconductor Devices ◽

10.1016/b978-044451339-7/50016-7 ◽

2003 ◽

pp. 115-119

Author(s):

Masaki Matsushita ◽

Md. Abul Kashem ◽

Shinzo Morita

Keyword(s):

Refractive Index ◽

Composite Film ◽

Film Formation

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Novel UV-assisted Rapid Thermal Annealing of Ferroelectric Materials

Rapid Thermal Processing for Future Semiconductor Devices ◽

10.1016/b978-044451339-7/50011-8 ◽

2003 ◽

pp. 75-82 ◽

Cited By ~ 1

Author(s):

E. Lynch ◽

S. O'Brien ◽

P.V. Kelly ◽

H. Guillon ◽

L. Pardo ◽

...

Keyword(s):

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Ferroelectric Materials

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Properties of Phosphorus-Doped Polycrystalline Silicon Films Formed by Catalytic Chemical Vapor Deposition and Successive Rapid Thermal Annealing

Rapid Thermal Processing for Future Semiconductor Devices ◽

10.1016/b978-044451339-7/50009-x ◽

2003 ◽

pp. 63-68

Author(s):

Rui Morimoto ◽

Akira Izumi ◽

Atsushi Masuda ◽

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Catalytic Chemical Vapor Deposition ◽

Polycrystalline Silicon Films ◽

Phosphorus Doped

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Rapid Thermal Processing for Future Semiconductor DevicesLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Elsevier

Si Epitaxial Growth on the Atomic-Order Nitrided Si(100) Surface in SiH4 Reaction

Process and Technology Drivers for Single Wafer Processes in DRAM Manufacturing

Ultra-high vacuum rapid thermal chemical vapor deposition for formation of TiN as barrier metals

High-Performance Poly-Si TFT and its Application to LCD

Copyright

Analytical Model for Spike Annealed Diffusion Profiles of Low-Energy and High-Dose Ion Implanted Impurities

Implementations of Rapid Thermal Processes in Polysilicon TFT Fabrication

Large Refractive Index C-S-Au Composite Film Formation by Plasma Processes

Novel UV-assisted Rapid Thermal Annealing of Ferroelectric Materials

Properties of Phosphorus-Doped Polycrystalline Silicon Films Formed by Catalytic Chemical Vapor Deposition and Successive Rapid Thermal Annealing

Rapid Thermal Processing for Future Semiconductor Devices
Latest Publications