Properties of Phosphorus-Doped Polycrystalline Silicon Films Formed by Catalytic Chemical Vapor Deposition and Successive Rapid Thermal Annealing
2002 ◽
Vol 41
(Part 1, No. 2A)
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pp. 501-506
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1982 ◽
Vol 56
(2)
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pp. 313-323
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1999 ◽
Vol 337
(1-2)
◽
pp. 248-252
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1997 ◽
Vol 144
(11)
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pp. 3952-3958
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2001 ◽
Vol 40
(Part 2, No. 11B)
◽
pp. L1207-L1210
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1990 ◽
Vol 137
(11)
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pp. 3666-3674
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