Reproducibility in the negative differential resistance characteristic of In0.17Al0.83N/GaN resonant tunneling diodes—Theoretical investigation

2013 ◽  
Vol 113 (19) ◽  
pp. 194509 ◽  
Author(s):  
Haoran Chen ◽  
Lin'an Yang ◽  
Shuang Long ◽  
Yue Hao
1996 ◽  
Vol 448 ◽  
Author(s):  
Akira Izumi ◽  
Noriyuki Matsubara ◽  
Yusuke Kushida ◽  
Kazuo Tsutsui ◽  
Nikolai S. Sokolov

AbstractWe proposed use of a new CdF2/CaF2 heterointerface for the formation of large conduction band discontinuities to apply quantum effect devices fabricated on Si substrates. Resonant tunneling diodes using this heterointerface on Si were fabricated and negative differential resistance whose P/V current ratio of 24 at highest was observed at room temperature.


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